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Digitale Medien

Thermal expansion of siliconated pyrolytic carbon (1974)

Aoki, K. ; Cheng, M. Y. ; Hirai, T. ; [weitere]

Springer

Journal of materials science 9 (1974), S. 1159-1164

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Details

ISSN: 1573-4803

Quelle: Springer Online Journal Archives 1860-2000

Thema: Maschinenbau

Notizen: Abstract The lattice and bulk thermal expansions perpendicular to the layer plane of siliconated pyrolytic carbon, PC(Si), produced by pyrolyzing a mixture of propane gas and silicon tetrachloride vapour at the deposition temperatures of 1440 to 2025° C, have been measured over the temperature ranges 20 to 550° C and 20 to 960° C, respectively. The expansion behaviours of PC(Si) are related to the density and the degree of preferred orientation of crystallites, as is the case for pyrolytic carbon without silicon “PC”. At a deposition temperature of about 1700° C, the bulk thermal expansion coefficient of PC(Si) is about three times as large as that of PC.

Materialart: Digitale Medien

URL: http://dx.doi.org/10.1007/BF00552833

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