ISSN:
1432-0630
Keywords:
66.30jt
;
61.70Wp
Source:
Springer Online Journal Archives 1860-2000
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
Abstract Using the hydrogen neutralization of the boron acceptor, the diffusion of hydrogen is investigated in the temperature range 20 °–160 °C. The hydrogenation is performed by low-energy implantation. We observe a fast initial hydrogen migration, followed by a long-time diffusion phase that is described by an effective diffusion coefficientD eff=D 0 eff exp(−E a/kT) withD 0 eff–cm2s−1 andE a=(0.83±0.05) eV. No deeper hydrogen migration is detected for implantation times longer than − 30 min. Our data are explained by the build-up of a large amount of molecular hydrogen beneath the surface, which strongly hinders the transfer of the implanted hydrogen to the bulk. The thermal reactivation kinetics of the neutralized boron show a rapid initial step followed by a longtime thermally activated second order phase, which is limited by the recombination of hydrogen into molecules.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF00617761
Permalink
