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Focused ion beam lithography and its application to submicron devices

Morimoto, H. ; Sasaki, Y. ; Saitoh, K. ; [et al.]

Amsterdam : Elsevier

Microelectronic Engineering 4 (1986), S. 163-179

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ISSN: 0167-9317

Keywords: Focused ion beam ; lithography ; resist ; semiconductor devices ; sputtering

Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002

Topics: Electrical Engineering, Measurement and Control Technology

Type of Medium: Electronic Resource

URL: http://linkinghub.elsevier.com/retrieve/pii/0167-9317(86)90009-2

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Technologies for electron beam direct writing

Kato, T. ; Watakabe, Y. ; Saitoh, K. ; [et al.]

Amsterdam : Elsevier

Microelectronic Engineering 1 (1983), S. 69-90

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ISSN: 0167-9317

Keywords: CAD-EBES network ; EB direct writing ; EB technology

Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002

Topics: Electrical Engineering, Measurement and Control Technology

Type of Medium: Electronic Resource

URL: http://linkinghub.elsevier.com/retrieve/pii/0167-9317(83)90013-8

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Isolation of the mixed ligand complex of beryllium(II) with acetylacetone and thenoyltrifluoroacetone by gel permeation chromatography (1981)

Noda, H. ; Saitoh, K. ; Suzuki, N.

Springer

Chromatographia 14 (1981), S. 189-191

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ISSN: 1612-1112

Keywords: Gel-permeation chromatography ; Beryllium complexes

Source: Springer Online Journal Archives 1860-2000

Topics: Chemistry and Pharmacology

Notes: Summary The mixed ligand, metal complex (acetylacetonato) (thenoryltrifluoroacetonato) beryllium(II) has been isolated from a reaction mixture of bis(acetylacetonato) beryllium(II) and bis(thenoyltrifluoroacetonato)beryllium(II) in ethyl acetate by gel permeation chromatography using Shodex 801 gel column and ethyl acetate as the solvent.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1007/BF02260150

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