ISSN:
0948-1907
Keywords:
Cubic boron nitride
;
Plasma-assisted CVD
;
Diamond CVD
;
Hydrogen plasmas
;
Characterization
;
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Single-phase cubic boron nitride films of high quality might be of great importance as superhard wear-resistant coatings and semiconductive materials. This paper reviews deposition techniques, precursors, deposition parameters and substrates employed in plasma-assisted CHEMICAL VAPOR DEPOSITION (PACVD) of cubic boron nitride (c-BN) as well as procedures applied for the characterization of c-BN-containing films. Mechanisms of the formation of sp3-hybridized boron nitride during PACVD by use of either high-energy nitrogen and argon ions or hydrogen plasmas are discussed. All experimental results on PACVD of c-BN are thought to fit either “physical” or “chemical” routes for c-BN low-pressure synthesis, which are based on principles of c-BN physical vapor deposition or diamond CVD.
Additional Material:
19 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/cvde.19970030502
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