ISSN:
0948-1907
Keywords:
Chemical vapor deposition
;
Titanium carbide
;
Fe-group metals
;
Deposition rate
;
Morphology
;
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
A number of experiments and computer simulations involving chemical vapor deposition (CVD) of TiC or TiN on various substrates containing Fe, Co or Ni allow the following mechanism of the influence of these metals on the CVD process to be assumed: These metals, being transferred from the substrate into the coating, evidently accelerate the decomposition of methane and enhance its reactivity at the substrate surface. Carburization of titanium, formed due to hydrogen reduction of TiCl4, which is a limiting stage of the TiC CVD, is activated in this way. The deposition rate, structure and morphology of the TiC coatings are affected by the presence of Fe, Co or Ni at the deposition zone, due to their catalytic effect on the process of methane activation and decomposition.
Additional Material:
15 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/cvde.19960020509
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