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  • 1
    Electronic Resource
    Electronic Resource
    CW CO2-Laser SF6-Photosensitized Pyrolysis of Tetralin (1986)
    New York, NY : Wiley-Blackwell
    Journal für Praktische Chemie/Chemiker-Zeitung 328 (1986), S. 413-418 
    Details
    ISSN: 0021-8383
    Keywords: Chemistry ; Organic Chemistry
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Notes: CW CO2 laser photosensitized (SF6) pyrolysis of tetralin proceeds mainly via dehydrogenation channel affording 1,2-dihydronaphthalene and naphthalene. Less important ring cleavage products are indene, styrene, ethylbenzene, toluene, and benzene, together with ethylene and methane. No occurrence of polyaromatics and high yields of ethylene compared to methane are the features differing this process from high temperature conventional pyrolysis.
    Additional Material: 3 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/prac.19863280317
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    Paper (German National Licenses)
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  • 2
    Electronic Resource
    Electronic Resource
    Zur thermischen Cyclisierung und Aromatisierung von Hex-1-en-5-inHerrn. Prof. Dr. Gerhard Zimmermann zum 60. Geburtstag gewidmet (1990)
    New York, NY : Wiley-Blackwell
    Journal für Praktische Chemie/Chemiker-Zeitung 332 (1990), S. 699-709 
    Details
    ISSN: 0021-8383
    Keywords: Chemistry ; Organic Chemistry
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Notes: On the Thermal Isomerization and Aromatization of Hex-1-ene-5-yneThe gas phase conversion of hex-1-ene-5-yne induced by conventional hot-wall pyrolysis, very low pressure pyrolysis (VLPP-MS technique) and continuous-wave CO2 laser-photosensitized (SF6) pyrolysis was studied at 350-1100°C.The pyrolysis experiments were performed in quartz reactors and the reaction products analyzed by capillary gas chromatography, mass and n.m.r. spectroscopy. The pattern of conversion suggested for all the processes involved a sequence of isomerizations (→hexa-1,2,5-triene→methylcyclopentenes), aromatization (into benzene via pentafulvene) and C—C bond rupture (into propargyl and allyl radicals).The formation of benzene is explained by reaction network with methylenecyclopentenes and methylcyclopentadienes as key intermediates.
    Additional Material: 3 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/prac.19903320519
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    Paper (German National Licenses)
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  • 3
    Electronic Resource
    Electronic Resource
    Laser evaporation of some solid organosilicon polymers (1991)
    New York, NY [u.a.] : Wiley-Blackwell
    Applied Organometallic Chemistry 5 (1991), S. 57-64 
    Details
    ISSN: 0268-2605
    Keywords: Laser evaporation ; deposition ; polysilane ; poly(sila-alkene) ; Chemistry ; Industrial Chemistry and Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Notes: Continuous wave (cw) CO2 laser irradiation of some organosilicon polymers composed of -Me2Si-, -Me2SiMe2SiCH2-, RMeSi- and RMeSiMe2SiCH2CH2- units (where R = methyl, adamantyl, phenyl and hydrogen) leads to the evaporation of the polymer and is dominated by the formation of a solid deposit that has a continuous structure. It is assumed that chemical changes occur prior to the transfer of ejected material to the gas phase and that these consist mainly of the formation of high molecular biradicals or 1,2-disilacyclobutane monomer that both re-polymerize spontaneously upon their deposition onto a nearby cold surface. The mechanism of these specific decompositions of the polymers is assessed on the basis of the IR spectra of the deposits and, for the minor gaseous products, identification by GC MS techniques.
    Additional Material: 3 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/aoc.590050108
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    Paper (German National Licenses)
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  • 4
    Electronic Resource
    Electronic Resource
    Si/C Phases from the IR Laser-induced Decomposition of Silacyclobutane and 1,3-Disilacyclobutane (1996)
    New York, NY [u.a.] : Wiley-Blackwell
    Applied Organometallic Chemistry 10 (1996), S. 83-99 
    Details
    ISSN: 0268-2605
    Keywords: laser ; chemical vapour deposition ; thin films ; Si/C/H materials ; silacyclobutane ; 1,3-disilacyclobutane ; silicon carbide ; Chemistry ; Industrial Chemistry and Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Notes: CO2 laser-induced infrared multiphoton decomposition (IRMPD) and SF6 photosensitized decomposition (LPD) of silacyclobutane (SCB) and 1,3-disilacyclobutane (DSCB) in the gas phase results in the very efficient deposition of Si/C/H and SiC materials, and it is inferred that the process is dominated by formation of transient silene; silene rearrangement to methylsilylene; silene and methylsilylene dehydrogenation; and polymerization of SiCHn (n 〈 4) species. The deposits are sensitive to oxygen.Decomposition and SiC formation are favoured with IRMPD experiments conducted with high-energy fluxes. The laser technique is promising for low-temperature chemical vapour deposition of amorphous SiC.
    Additional Material: 13 Ill.
    Type of Medium: Electronic Resource
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    Paper (German National Licenses)
  • 5
    Electronic Resource
    Electronic Resource
    Si/C/F/H materials from laser-explosive decomposition of fluoromethylsilanes (1993)
    New York, NY [u.a.] : Wiley-Blackwell
    Applied Organometallic Chemistry 7 (1993), S. 381-389 
    Details
    ISSN: 0268-2605
    Keywords: Si/C/H/F materials ; laser deposition ; laser spallation ; structure ; reactivity ; Chemistry ; Organic Chemistry
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Notes: Solid Si/C/H/F materials laser-deposited from gaseous fluoro-methylsilanes are examined by XPS, SEM, IR and Raman spectroscopy and revealed to be a blend of silicon-carbon-based frameworks, possessing some Si-H and C-H bonds, and carbon whose modification is dependent on the structure of the parent fluoromethylsilane. Their properties are affected by contact with the atmosphere: although incorporation of oxygen into silicon-carbon frameworks is a very fast process, the dramatically improved adhesion to aluminium requires long exposure periods.
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/aoc.590070605
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    Paper (German National Licenses)
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