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  • 1
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The local atomic environment of the Sb dopant in 2 and 5×1016 ions/cm2 implanted Si samples has been studied by near grazing incidence fluorescence extended x-ray absorption fine structure at different stages of the Sb deactivation process. The annealings were performed at high temperature (900–1000 °C) during various periods: 30 s–4 h. The Sb out-diffusion and the high percentage of Sb precipitates are put into evidence especially for Sb-only implanted samples. The comparison of the Sb and B codiffusion data with the corresponding ones obtained by the diffusion of Sb alone revealed several anomalous effects due to dopant interaction. Moreover, a simulation program including dopant precipitation and donor–acceptor pairing allows us to foresee most of the anomalous phenomena occurring in high-concentration codiffusion experiments. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 61 (1987), S. 390-396 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Aluminum contacts on silicon have been realized for very large scale integration applications by interposing a titanium nitride diffusion barrier. The TiN films have been prepared by implanting nitrogen ions on silicon wafers coated with titanium layers of different thicknesses (60, 80, and 100 nm); by a subsequent annealing in vacuum, films of TiSi2, from 0 up to 75 nm thick, grow at the nitride/silicon interface. The Al/TiN/Si and Al/TiN/TiSi2/Si structures have been annealed at 600 °C for 30 and 10 min, which in some cases results in barrier degradation, due to Al/Si interdiffusion. Cross-sectioned specimens of these contacts have been studied by analytical transmission electron microscopy (AEM) employing a Philips EM 400T microscope, equipped with a field emission gun. It has been found that, contrary to previous suggestions, the TiN film does not dissolve during the failure process, but retains its morphology and a sharp interface with the neighboring layers. Unlike scanning electron microscopy experiments, where the Al film must be removed after the barrier degradation to investigate the pits formed by the massive migration of Si into Al, AEM on cross sections allowed us to make an accurate structural and compositional characterization of the material filling these pits. In addition, when the annealing treatment does not result in the barrier failure, the migration of Al, Ti, and Si throughout the structure can be easily detected and analyzed.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 58 (1985), S. 264-267 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Current effects in heavy arsenic implants into silicon protected by a SiO2 layer were studied by Rutherford backscattering, spectrometry, differential sheet resistivity and Hall mobility measurements, Auger electron spectrometry, and transmission electron microscopy. It was found that oxygen atoms recoiled into silicon by the impinging arsenic ions affect the solid-phase epitaxial regrowth during the low-temperature ((approximately-equal-to)500 °C) postimplant anneal. A complete stopping in the regrowth was noticed in samples implanted at 1016 cm−2 at low current and annealed at 500 °C. These results show that the procedure suggested to obtain high-quality implanted layers, i.e., (1) formation of an amorphous layer with implants at low temperature and (2) solid-phase epitaxy at about 500 °C, is not suitable for implants through a SiO2 layer.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 57 (1985), S. 270-275 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The silicide formation with a titanium film deposited on 〈100〉 single-crystal silicon, has been studied by using nuclear microanalysis, x-ray diffraction, and transmission electron microscopy. The presence of interfacial defects and their possible role in the early stages of the reaction has been evidenced. The phase composition was dependent on the annealing temperature and time: at 550 °C only TiSi2 is observed; at higher temperatures (〉600 °C), a thin TiSi2 layer at the interface is again observed, but Ti-rich silicides grow on top of this layer by increasing the annealing time. For longer annealing times, all the reacted layer progressively transforms into TiSi2. The amount of reacted silicon grows with a (time)1/2 law; the activation energy of 1.8 eV reported for the growth of TiSi2 onto amorphous Si may be appropriate even in this case. The reaction proceeds at a rate of one order of magnitude higher than previously reported for reaction between silicon and an oxygen saturated titanium film. The kinetics seems to be controlled by silicon diffusion through the TiSi2 interfacial layer.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 126-133 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Backscattering and ion channeling measurements have been carried out on 〈100〉 silicon wafers implanted with a dose of 3×1016 As+/cm2. These samples have been submitted to laser annealing and then to various thermal annealings in the 350–1000 °C temperature range. Three different crystallographic directions, 〈100〉, 〈110〉, and 〈111〉, have been explored. The deactivated As atom displacement with respect to the lattice sites has occurred already by the first stage of electrical deactivation at 350 °C. The average displacement is constant in the considered temperature range and has been found equal to 0.23±0.06 A(ring) making an angle of 23±8° with the [100] direction. By comparing this finding with the local atomic As arrangement, deduced from previously reported extended x-ray absorption fine structure measurements performed on the same samples, new cluster models are presented. These models consist of As2V and As4V clusters during the very early stage of deactivation, and of several As4V clusters grouped together giving rise to larger AsmVn agglomerates (m up to 12 and n up to 5). In this context, the average As displacement mainly results from the combined displacements of As atoms inside the clusters. The thermal evolution of the As agglomerates at higher temperatures is also discussed.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 3962-3967 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Molybdenum silicide is investigated because of its possible application in a self-aligned process for ultra large scale integration technology. p+/n shallow junctions are fabricated by boron implantation through Mo films or MoSi2 layers and rapid thermal annealing. Both procedures enable us to obtain junctions as shallow as 130 nm with very good electrical characteristics (reverse current density 1 nA/cm2 at −1 V, ideality factor 1.05 and contact resistivity 1×10−6 Ω cm2). The influence of a surface preamorphization with different thicknesses on junction depth and electrical characteristics is reported.
    Type of Medium: Electronic Resource
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  • 7
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Laser-annealed and further thermally annealed arsenic implanted silicon specimens have been investigated in a range of doses from 1×1016 to 5×1016 As/cm2, with different experimental techniques: electrical measurements, transmission electron microscopy (TEM), double-crystal x-ray diffractometry (DCD), and extended x-ray absorption fine structure analysis (EXAFS). On the as laser-annealed samples, in the whole range of doses examined, a lattice contraction of the doped layer has been evidenced by DCD, whereas, on the same specimens, EXAFS measurements have shown the presence of a local expansion around substitutional As atoms. The relationship between strain and carrier concentration has been found to be approximately linear and can be described by the presence of a size and an electronic effect, as recently proposed in the literature. The former effect represents the atomic size contribution, while the latter is the strain induced by the variation of the conduction-band minima due to the doping. After a subsequent thermal annealing in a low-temperature range (350–550 °C), a strong deactivation of the dopant has been evidenced by electrical measurements. From the experimental results, a new model of the first step of the As deactivation phenomenon at low temperature is proposed. It is described by the capture of two electrons from a pair of As atoms in the second neighbor position in the Si lattice, leading to the formation of a positively charged arsenic-vacancy cluster (As2V)+, and to the emission of a negatively charged Si self-interstitial I−. This model takes into account the main phenomena that are experimentally observed simultaneously to the As deactivation, i.e., the transition from a contraction to a dilatation of the strain observed by DCD and the formation of interstitial loops. At relatively high temperatures (650–900 °C), the hypothesis of the coexistence of the clusters and of the observed precipitates has to be taken into account in order to explain the nature of the inactive As. However, whether clustering or precipitation is the dominant phenomenon still remains an open question.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 59 (1986), S. 1908-1917 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Supersaturated solutions of substitutional, electrically active Sb in 〈100〉 silicon single crystals have been obtained by ion implantation, followed by short-duration incoherent-light annealing. Substitutional and nonsubstitutional fractions have been studied as functions of implanted dose and anneal temperature by Rutherford backscattering and channeling techniques, transmission-electron microscopy, Hall-effect and resistivity measurements (combined with layer removal), and Mössbauer spectroscopy. The maximum electrically active concentration, which can be incorporated on undisturbed substitutional sites, is found to be 4.5×1020 Sb/cm3 for 700 °C annealing. Upon further annealing, the supersaturated solution is reduced and approaches the Trumbore solubility value at temperatures of about 1100 °C. The Sb going out of solution is shown for the first time to be created in two different surroundings: Sb is predominantly found in Sb-vacancy complexes for low doses and low annealing temperatures and in Sb precipitates for high doses and/or high annealing temperatures. Complete agreement is found between substitutional fractions derived from Mössbauer spectroscopy and electrically active fractions from Hall-effect measurements, whereas the substitutional fractions from channeling measurements are significantly higher. The experiments are not conclusive as to whether this difference is due to the fraction of Sb in Sb-vacancy complexes or in coherent Sb precipitates.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 68 (1996), S. 2831-2833 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: High order Laue zone lines present in the central disk of convergent beam electron diffraction patterns have been used to determine the bulk mismatch in thinned, cross-sectioned heterostructures, where a relaxation occurs along the thinning direction. The position of these lines is sensitive to lattice parameters along different crystallographic directions, so that information on the residual strain along the growth and the thinning directions can be extracted from a single diffraction pattern. This information has been properly combined using the isotropic elasticity theory to give the bulk mismatch. The results are in good agreement with independently obtained bulk measurements. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 61 (1992), S. 264-266 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The electrical deactivation of Sb atoms highly implanted (2 and 5×1016 ions/cm2) in crystalline silicon is studied by the extended x-ray absorption fine structure (EXAFS) method. By following the evolution of the local atomic environment around the Sb atoms it is shown that the description of the deactivation process must take into account the existence of vacancy complexes, SbV2, in addition to the usual antimony rhombohedric precipitates. These vacancy complexes are already present after laser annealing in the 5×1016 ions/cm2 case. Co-implantation with boron delays the precipitation of Sb particles, by forming new complexes, SbBV or SbB2, with a Sb atom surrounded by two sites (B and/or vacancy).
    Type of Medium: Electronic Resource
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