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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 3590-3592 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Radial optical emission profiles are determined from Abel inverted emission spectroscopy of a parallel plate radio frequency system known as a GEC Reference Cell. These profiles in general show a nonuniform plasma, annular in shape. Etching results of silicon wafers also follow this annular pattern. This effect is explained by numerically computed large radial and axial electric fields near the edge of the electrodes, produced by the presence of the grounded dark shields.
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 1089-7674
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A collaborative experimental effort was initiated at a workshop at the 1988 Gaseous Electronics Conference (GEC) to start a program to understand the fundamental physics of processing plasmas, as well as give researchers a baseline experiment to develop plasma diagnostics to be used on manufacturing plasma systems. The design was based on the use of 4 in. diameter, aluminum electrodes in a parallel plate configuration at 13.56 MHz, run in a capacitively coupled discharge mode. Before conclusions about commercial plasma systems can be made from experimental results from the GEC cell, the GEC cell must be shown to behave similarly to that of a commercial system. The etching performance of a GEC cell was compared to a SEMI Group 1000 TP/CC reactive ion etcher (RIE). The GEC cell and the RIE gave similar etch rates and fluorine concentrations when the electrode plate spacing and power density were the same. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 62 (1987), S. 2553-2555 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Results are presented of the first experiments in which high-current electron beam injection is shown to modify the combustion of both lean and rich ethylene-air mixtures. The rate of pressure rise in the chamber increases by up to a factor of 2 and flame speed increases by 40%–50% for cases in which an electron beam is injected into a spark-ignited nonstoichiometric ethylene-air mixture. Spectroscopic emission from the flame is modified by electron beam injection with more rapid rise and decay of OH line emission. Further research is needed to identify the cause of the observed enhancement in combustion rate.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 59 (1986), S. 2251-2253 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Visible emission spectroscopy (330–650 nm) has been performed radially and axially on a Z-pinch plasma. During the peak compression, continuum and He ii line emission (468.6 nm) predominated. We report the first observation of He2 in the post-pinch phase of a dense helium Z-pinch discharge. Axial measurements of this afterglow plasma also revealed pronounced absorption bands which cannot be identified with He2, He i, He ii, or impurities.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 60 (1986), S. 99-103 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Visible emission spectroscopy of long pulse, relativistic, electron-beam (300 ns, 1 kA, 300 keV) -produced argon plasmas has been performed over a wide pressure range (1–750 Torr). The emission spectra were observed between 350 and 600 nm with a spectrograph coupled to an optical multichannel analyzer, which was gated with pulses of 50 and 500 ns. Singly ionized argon lines were observed at all pressures and all times during the beam current. The relative line intensities for the (4s–4p) transitions fit those described by an equilibrium distribution at approximately 2 eV. The emission lines originating from the higher excited states of (4s'–4p') and (4s‘–4p‘) were much larger than expected in a 2-eV plasma, and this enhancement can be attributed to the presence of the beam electrons.
    Type of Medium: Electronic Resource
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  • 6
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A "reference cell'' for generating radio-frequency (rf) glow discharges in gases at a frequency of 13.56 MHz is described. The reference cell provides an experimental platform for comparing plasma measurements carried out in a common reactor geometry by different experimental groups, thereby enhancing the transfer of knowledge and insight gained in rf discharge studies. The results of performing ostensibly identical measurements on six of these cells in five different laboratories are analyzed and discussed. Measurements were made of plasma voltage and current characteristics for discharges in pure argon at specified values of applied voltages, gas pressures, and gas flow rates. Data are presented on relevant electrical quantities derived from Fourier analysis of the voltage and current wave forms. Amplitudes, phase shifts, self-bias voltages, and power dissipation were measured. Each of the cells was characterized in terms of its measured internal reactive components. Comparing results from different cells provides an indication of the degree of precision needed to define the electrical configuration and operating parameters in order to achieve identical performance at various laboratories. The results show, for example, that the external circuit, including the reactive components of the rf power source, can significantly influence the discharge. Results obtained in reference cells with identical rf power sources demonstrate that considerable progress has been made in developing a phenomenological understanding of the conditions needed to obtain reproducible discharge conditions in independent reference cells.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 60 (1992), S. 818-820 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The relative concentration of atomic fluorine was measured in a radio frequency (rf) glow discharge and a modified electron cyclotron resonance microwave/rf hybrid discharge in CF4 using an actinometric technique. The dependence of fluorine concentration on rf and microwave power, pressure, flow, and excitation source are presented. Anomalous behavior with rf power at constant microwave power was observed when using the Ar 750-nm line as the actinometric species.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 71 (1997), S. 1467-1468 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A spatially resolved optical emission spectroscopy sensor has been developed, and the resulting reconstructed radial emission profiles from an ArI and ArII line compare well with Ar sputter etch uniformity profiles. The new sensor collects light from a wedge shaped field of view, and is rotated around a single collection point in order to observe the entire plasma through a relatively small viewpoint. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 63 (1992), S. 1792-1797 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Pulsed and continuous-wave microwaves at 2.45 GHz combined in an Asmussen resonant cavity are used to vaporize, dissociate, and excite copper chloride discharges. Steady state microwaves from 50 to 150 W sustain a microwave discharge which heats and dissociates the copper chloride to a sufficient vapor pressure. A variable frequency (2.45 to 2.60 GHz) pulsed microwave source with pulse widths ranging from 0.5 to 2 ms, repetition rates of 500 to 5000 Hz and a peak output power of 4,500 W then excites the copper atomic states. The two microwave signals are superimposed using a hybrid junction before input into the resonant cavity. Microwave frequencies of the pulsed portion of the signal around 2.50 GHz provided maximum absorption by the discharge. This device is being examined as a potential pump source for a copper vapor laser.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 72 (2001), S. 3095-3099 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A novel experiment to investigate single-surface multipactor on a dielectric surface was developed and tested. The compact apparatus consists of a small brass microwave cavity in a high vacuum system. The cavity is ∼15 cm in length with an outer diameter of ∼10 cm. A pulsed variable frequency microwave source at ∼2.4 GHz, 2 kW peak excites the TE111 mode with a strong electric field parallel to a dielectric plate (∼0.2 cm thickness) that is inserted at midlength of the cavity. The microwave pulses are monitored by calibrated microwave diodes. An electron probe measures electron current and provides temporal measurements of the multipactor electron current with respect to the microwave pulses. Phosphor on the dielectric surface is used to detect multipactor electrons by photoemission. The motivation of this experiment is to test recent theoretical calculations of single-surface multipactor on a dielectric. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
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