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  • 1
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Analytical chemistry 56 (1984), S. 1519-1521 
    ISSN: 1520-6882
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Fresenius' Zeitschrift für analytische Chemie 324 (1986), S. 625-634 
    ISSN: 1618-2650
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Description / Table of Contents: Summary This paper addresses three aspects of the surface analytical experiment which are felt to be particularly crucial in characterizing corrosion mechanisms: chemical speciation, microscopic analysis and improved control of experimental conditions. X-ray Photoelectron Spectroscopy (XPS or ESCA) has been particularly effective in differentiating chemical species. The major chemical use of XPS is limited however to the outer surface of the film. Depth profiling by ion bombardment frequently degrades the chemical information available in the film interior and at the metal-oxide interface, and this is often where corrosion mechanisms are established. Mechanical methods of film penetration are thus encouraged to use XPS to its maximum capability. Microscopic analysis of corrosion surfaces using Scanning Auger Microscopy (SAM) or Secondary Ion Mass Spectrometry can reveal effects such as grain boundary segregation and oxide nucleation. Another important aspect of corrosion film analysis is the preparation of the metal surface itself. The oxidized surface can be strongly influenced by preparation artefacts such as cold work or impurities. Three different studies are used to illustrate these aspects: (i) the analysis of a molybdenum inhibitor layer on a steel surface; (ii) the study of corrosion product release from 304-stainless steel; and (iii) the effects of H+ ion bombardment to anneal mechanical work on Ni-Cr alloy surfaces, prior to oxidation.
    Notes: Zusammenfassung Diese Arbeit betont drei Gesichtspunkte oberflächenanalytischer Untersuchung, die für die Charakterisierung von Korrosionsmechanismen als besonders wesentlich erachtet werden: die chemische Bindung, die mikroskopische Analyse und die verbesserte Steuerung experimenteller Bedingungen. Die Röntgen-Photoelektronenspektroskopie (XPS oder ESCA) ist für die Unterscheidung chemischer Spezies besonders erfolgreich gewesen. Die Anwendung von XPS beschränkt sich jedoch im wesentlichen auf die äußere Oberfläche einer Schicht. Die Aufnahme von Tiefenprofilen mit Hilfe von Ionenbeschuß vermindert häufig die chemische Information, die vom Schichtinnern und vom Metall-Oxid-Interface erhältlich wäre; und hier spielen sich oft die Korrosionsvorgänge ab. Mechanische Methoden des Dünnschichtabtrags sind somit aufgefordert, XPS bis an die Leistungsgrenze zu bringen. Mikroskopische Untersuchungen von Korrosionsschichten mittels Raster-Auger-Mikroskopie (SAM) oder Sekundärionen-Massenspektrometrie können Effekte wie die Korngrenzensegregation und die Oxidbildung aufdecken. Ein weiterer bedeutender Gesichtspunkt der Analyse von Korrosionsschichten ist die Behandlung der Metalloberflächen selbst. Die oxidierte Oberfläche kann durch Behandlungsfehler wie z.B. Kaltbearbeitung oder Verunreinigung stark beeinflußt werden. An Hand von drei verschiedenen Beispielen werden diese Aspekte illustriert: (i) die Analyse einer Molybdän-Schutzschicht auf Stahl; (ii) die Untersuchung von Korrosionsprodukten auf 304-Edelstahl; und (iii) die Effekte des H+-Ionenbeschusses zum Ausheilen mechanischer Schäden auf der Oberfläche von Ni-CrLegierungen, vor der Oxidation.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 7 (1985), S. 69-73 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Strong suppression of molecular ions in positive secondary ion mass spectra (SIMS) is achieved by electric isolation of a specimen (SI) with an electrically charged aperture situated immediately above its surface. This technique is also useful for controlling the surface charging on an insulator. The origin of this phenomenon has been explored using metals and semiconductors as models. The strong molecular suppression effect is found to result from the very high ion kinetic energies (〉400 eV) emerging from the surface under SI conditions. The charged aperture is believed to stabilize surface charging by confining it within a small region. SI methods for reducing molecular ions in silicon and mild steel specimens reduce major molecular fragments by 3-4 orders of magnitude.
    Additional Material: 6 Ill.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 5 (1983), S. 181-185 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: A new approach to the suppression of molecular ions in secondary ion mass spectra of insulating specimens is reported. Using a Cameca IMS 3f instrument, with unconventional primary beam conditions and uncoated samples, it has been possible to almost eliminate the contribution of molecular ions to the mass spectrum. This has resulted in excellent discrimination for major and trace element detection in these materials, including complete resolution of the rare earth elements in a number of minerals.
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
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