Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
64 (1994), S. 2643-2645
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
This work is devoted to the study of the expansion of a Ar-CH4 microwave plasma. Diagnostics have been performed within the reactor using both an electrostatic Langmuir double probe and spatially resolved emission spectroscopy. We have proven that the plasma jet results from electromagnetic surface wave propagation (ne≥nec=3.6×1011 cm−3, Te∼23 000–46 000 K) and have shown that injection of methane into the jet decreases ne and Te, and thus limits the striking conditions. Such an expanding plasma finds applications in plasma enhanced chemical vapor deposition technology. It can be used to create simple radicals close to a substrate and thus limits their destruction on the reactor walls.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.111478
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