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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 239-250 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Spectroscopic ellipsometry has been used to study thick, relaxed and thin, strained epilayers of Si1−xGex on Si in the range 0.1〈x〈0.25. Dielectric functions of relaxed Si0.87Ge0.13 and Si0.8Ge0.2 have been obtained and long-wavelength absorption coefficient values, required for interference fringe fitting, shown to be higher than measured previously. The dielectric function of strained Si0.78Ge0.22 has been measured for the first time and the effects of strain on the critical points shown to be consistent with deformation potential theory. An interpolation procedure has been developed for the fitting of layer composition and thickness, and excellent agreement with conventional techniques obtained for a series of uncapped single epilayers. The surface roughness of Si1−xGex epilayers has been studied as a function of time and deposition temperature and shown to play an important role in the modeling. The application of the technique to the characterization of buried strained layers is discussed.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 3729-3732 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Growth rates for Si1−xGex films (0≤x≤0.19) have been measured between 610–750 °C using low pressure H2/SiH4/GeH4 mixtures and at different temperatures these rates show different dependencies on composition x. A model attributes this complex behavior to competition between an increasing rate for desorption of surface hydrogen and a decreasing sticking probability for the reactive hydrides as x increases. The latter effect is explicitly reported for the first time. GeH4 is found to be ∼4.7 times more reactive than SiH4, and relative surface hydrogen coverages on Si and Si0.87Ge0.13 films measured by secondary ion mass spectroscopy are compared with the model.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 1279-1286 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The nature of differential ion damage in AlAs-GaAs epitaxial heterostructures is explored using conventional and high-resolution transmission electron microscopy, together with Rutherford backscattering spectrometry. By use of Si+ ion implantation, the rapid buildup of lattice damage in GaAs, and the relative resistance of AlAs to structure breakdown is highlighted. The ion dose levels required for bulk amorphization of the two materials differ by at least two orders of magnitude. The way in which lattice disorder changes near the AlAs/GaAs interface is studied in detail and it is demonstrated that the AlAs layer, which remains crystalline up to high ion doses, promotes in situ annealing of narrow zones of GaAs crystal adjacent to both of its interfaces. These crystalline GaAs zones show substantially enhanced resistance to ion damage accumulation but they contain planar defects and are finally rendered amorphous after extended ion bombardment. During this process, defects propagate into the edges of the AlAs layer which are then progressively amorphized in an apparently heterogeneous (boundary-dependent) manner. In addition, it is shown that GaAs in other regions of the sample is amorphized by a mechanism which at first leaves nanometer-scale blocks of crystal isolated within the newly formed amorphous material, although these blocks are then rapidly broken down by further bombardment. The way in which the implantation-damaged layers restructure during annealing treatment is also described. Up to ∼320 nm of amorphous GaAs beneath the AlAs layer can be regrown as a single crystal by the motion of two opposing growth interfaces during annealing at 800 °C.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 86 (1999), S. 7183-7185 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: SiGe/Si p-channel heteroepitaxial field effect transistor test structures in Si were fabricated by molecular beam epitaxy. Combined high-resolution transmission electron microscopy and energy-loss filtered imaging have been used to quantitatively determine the nanoscale Ge distribution across the SiGe alloy channel. The alloy grading at the edges of the channel has been found to be asymmetrical due to Ge segregation, with an exponential-like extended distribution directed towards the surface. The results agree well with the predictions of segregation theory and indicate that the concentration of Ge in the extended distribution lay in the range 10%–1% over a distance of several nanometers from the body of the channel. Secondary ion mass spectrometry measurements upon the same samples were insensitive to this short range extended Ge distribution. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 89 (2001), S. 4689-4696 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have studied a series of (111) oriented GaAs–InGaAs single quantum well, broad area lasers with active regions containing a range of indium concentrations, x, in order to understand the advantages and limitations of pseudomorphic strain. For x≤0.3, both an increased emission wavelength and reduced threshold current were observed with increasing x. The predominant cause of the wavelength increase is the reduction in bulk InGaAs band gap. The reduction in threshold current is attributed mainly to the reduced in-plane density of states caused by the strain induced lifting of the heavy and light hole degeneracy at the valence band edge. For x〉0.3, we see a marked deterioration in laser performance. However, we believe that this deterioration is not directly associated with strain relaxation at layer thicknesses beyond the critical value. Rather, imperfections in the AlGaAs cladding layers appear to seed the formation of dislocations within the strained regions. Within the limitation of strain relaxation, we observed monomode continuous wave emission at room temperature at wavelengths up to 1.072 μm and with threshold current densities as low as 74 A/cm2. The differential gain of 1.45×10−15 cm2 is around four times higher than measured on unstrained GaAs/AlGaAs single quantum well lasers. Like the reduction in threshold current density, this relatively high value is attributed to the strain induced reduction in the in-plane, heavy hole effective mass. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 6
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Triisopropyl indium (TIPIn) has been investigated as an alternative to trimethyl indium for use in chemical-beam epitaxy (CBE). In previous CBE studies of GaAs/AlGaAs growth, the replacement of methyl-containing precursors with ethyl- and isopropyl-containing precursors has been shown both to widen the substrate temperature window available for growth, and also to reduce unintentional carbon incorporation in the grown layers. In the present study of (100)InxGa1−xAs (0≤x≤0.1) growth using the new TIPIn source, in situ modulated-beam mass spectrometry studies have demonstrated a similar, and technologically very important, widening of the substrate temperature window. Furthermore, use of the new precursor combination, TIPIn and triisopropyl gallium, is also shown to generate state-of-the-art InGaAs material with electrical and optical properties directly comparable to corresponding material grown using molecular-beam epitaxy. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 2029-2034 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The growth and characterization of high quality epitaxial layers of GaInP and GaInP-containing quantum wells grown by solid-source molecular beam epitaxy (MBE) is reported. Bulk GaInP shows photoluminescence linewidths as small as 6.7 meV and double-crystal x-ray diffraction linewidths as narrow as 12.5 arcsec. Evidence for the presence of long-range ordering in MBE-grown GaInP is discussed. GaAs-GaInP quantum wells show good structural and optical quality. A comparison of the measured transition energies with the predictions of a simple, finite depth square well model suggests a very small value for the conduction band offset in this system. GaInP-(Al0.37Ga0.64)0.51In0.49P quantum wells show good optical properties with emission at energies as high as 2.15 eV (≡6000 A(ring) at 300 K) at 4.2 K for a 12 A(ring) well.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 7852-7865 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Transmission electron microscope, transmission electron diffraction, and high resolution electron microscope studies have been made of metal organic chemical vapor deposition In0.53Ga0.47As layers grown on (001) InP or GaAs substrates to investigate the CuPt-type atomic ordering and associated microstructures present. The amount of ordering, the geometry of the (1¯11) and (11¯1) ordered domains, and the occurrence of anti-phase boundaries (APBs) were determined as a function of the layer growth temperature and rate. The results are interpreted in terms of mechanisms involving ordering at the layer surface and disordering in a transition region below the surface. From a consideration of the former it is concluded that atomic steps associated with surface undulations have a major influence on the domain geometry and APBs. The different structures that occur, their dependence on growth conditions and their possible effects on the electrical and optical properties are discussed.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 55 (1989), S. 1303-1305 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Molecular beam epitaxy has been used to prepare multiple quantum well structures of CdTe/Cd1−xMnxTe on (001) InSb substrates. The growth of such a system on InSb allows the use of particularly low growth temperatures, hence minimizing interdiffusion effects. This study presents the first transmission electron microscope investigation of this multilayer system grown on InSb. The work clearly demonstrates that multiple quantum wells of high structural quality can be grown reproducibly over a wide range of layer thicknesses. The importance of efficient substrate surface cleaning prior to growth is demonstrated. In order to grow high structural quality multilayers, the choice of buffer layer is also important and a possible explanation for this observation is given.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 53 (1988), S. 1189-1191 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Molecular beam epitaxy has been used to grow thin (0.5 μm〈t〈10 μm) InSb epilayers on (100) GaAs substrates. Reflection high-energy electron diffraction studies indicate that the early stages of layer growth involve three-dimensional nucleation and the formation of a nonpseudomorphic structure. High-resolution electron microscopy studies of the interface are reported for the first time and directly confirm that the large lattice mismatch (14.6% at room temperature) is accommodated by the generation of misfit dislocations. Nevertheless, the structural quality of the InSb is observed to improve dramatically with increasing thickness. Detailed secondary-ion mass spectrometry measurements also demonstrate that there is no large-scale interdiffusion of constituent elements at the interface. Finally, electrical measurements show the InSb to be p type and comparable with homoepitaxial material.
    Type of Medium: Electronic Resource
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