ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
Conventional ion sources generate energetic ion beams by accelerating the plasma-produced ions through a voltage drop at the extractor, and since it is usual that the ion beam is to propagate in a space which is at ground potential, the plasma source is biased at extractor voltage. For high ion beam energy the plasma source and electrical systems need to be raised to high voltage, a task that adds considerable complexity and expense to the total ion source system. We have developed a system which though forming energetic ion beams at ground potential as usual, operates with the plasma source and electronics at ground potential also. Plasma produced by a nearby source streams into a gridded chamber that is repetitively pulsed from ground to high positive potential, sequentially accepting plasma into its interior region and ejecting it energetically. We call the device a peristaltic ion source. In preliminary tests we've produced nitrogen and titanium ion beams at energies from 1 to 40 keV. Here we describe the philosophy behind the approach, the test embodiment that we have made, and some preliminary results. © 1996 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1146782
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