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  • 1
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have produced epitaxial Si1−x−yGexCy/Si heterostructures by rapid thermal chemical vapor deposition using methylsilane SiCH6). These layers were grown in the SiH4/GeH4/SiCH6/H2 system between 550 and 600 °C at 1.5 Torr. Suitable process conditions were found that allow very efficient substitutional carbon incorporation. No carbon cross contamination was observed. Crystal quality, chemical composition, and lattice strain were deduced from Nomarski microscopy, transmission electron microscopy, Fourier transform infrared spectroscopy, secondary ion mass spectrometry, and x-ray diffraction. Defect-free alloy layers with compositions of up to 20 at.% Ge and 2.2 at. % C were produced. The lattice parameter was tailored so that the strain in these layers gradually moved from compressive to tensile. A tensile strain of up to 0.35% was achieved. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 59 (1991), S. 93-95 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report on the results of an experimental study of the diffusion of phosphorus in Si0.7Ge0.3 alloys for temperatures between 800 and 1050 °C. When the phosphorus concentration is lower than the intrinsic carrier concentration at the diffusion temperature, the diffusion has a simple Fickian behavior. The corresponding intrinsic diffusivity has an activation energy of 1.62 eV. On the other hand, at high concentration, the diffusion behavior of P in SiGe is similar to what is observed in pure Si, with concentration profiles exhibiting "kink and tail'' shapes. This suggests that the diffusion mechanisms are similar in both materials.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 24 (1996), S. 733-745 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: We have measured the depth resolution function of the SIMS analysis of boron in silicon for different experimental conditions and fitted this function with an analytical expression initially proposed by Dowsettet al. We use this analytical depth resolution function for the implementation of an iterative deconvolution algorithm, taking into account several properties of the signal, such as positivity and regularity. This algorithm is described precisely. The algorithm is tested on several theoretical structures and then implemented for the deconvolution of real structures of boron-doped silicon layers in silicon. In particular, a sample constituted by six consecutive delta layers and a 75 Å thick layer are deconvolved. It is shown that the asymmetry of the profiles is completely removed and that the full width at half-maximum of the deconvolved delta layers can be reduced down to 41 Å. It is also shown that a layer whose real thickness is smaller than the measured width of the resolution function can be easily distinguished from a delta layer, and its thickness estimated.
    Additional Material: 14 Ill.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 25 (1997), S. 464-477 
    ISSN: 0142-2421
    Keywords: SIMS ; deconvolution ; depth resolution ; boron ; silicon ; separability ; confidence level ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: In this paper, an iterative algorithm is used in order to deconvolve some real and simulated SIMS profiles of boron-doped layers in silicon.The real SIMS profiles are obtained by the analysis of delta layers of boron-doped silicon in a silicon matrix, analysed in a Cameca IMS3/4f instrument at oblique incidence. It is shown that two layers that are completely convolved by the SIMS experiment can be completely separated. In order to try to solve the problem of reliability of the deconvolution results, a confidence level is defined, which indicates the level below which the deconvolved profile should not be taken into account. Moreover, a parameter defined previously is used to define whether a satisfying solution of the deconvolution problem exists or not. This parameter is applied to the experimental profiles.The simulated profiles are chosen so that they correspond to real cases encountered by the SIMS analysts and clarify what can be expected from the method. Several characteristic features are examined, such as the separability of Gaussian functions or the dynamic range of the deconvolution of rising or falling functions. It is shown that the minimum distance between two delta layers that can be separated using 3.5 keV/O2+ primary beam SIMS analysis at oblique incidence is equal to 60 Å, and that abrupt error functions and exponential functions can be retrieved very satisfactorily. © 1997 John Wiley & Sons, Ltd.
    Additional Material: 14 Ill.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 26 (1998), S. 974-983 
    ISSN: 0142-2421
    Keywords: SIMS ; depth resolution ; deconvolution ; boron ; silicon ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: In this paper, the problem of the deconvolution of SIMS depth profiles is addressed. In particular, the hypotheses that are necessary for the deconvolution to be possible (in the actual state of the art) in the case of the SIMS signal are reviewed. Then, the principle of regularization, which is a mandatory step in the resolution of an ill-posed problem, is clarified. Two regularization methods used in the field of SIMS analysis are compared: Miller regularization and maximum entropy regularization.In a second part the study of a possible deconvolution, using a depth resolution function (DRF) that is not the DRF that has experimentally convolved the profile, is justified and theoretically addressed. Two cases arise: the DRF used in the deconvolution process is either thinner than the experimental DRF or it is thicker. It is shown that deconvolution using a DRF that is wider than the DRF that actually convolved the profile is possible, and must be taken into consideration. Some examples of simulated deconvolutions with a false DRF are given, and some tools are proposed that are theoretically able to detect a problem when the DRF used in the deconvolution process is wider than the real DRF.In the last section, an example of experimental deconvolution shows that the deconvolution process is able to provide reliable information. In particular, deconvolution of a SIMS analysis conducted at 5.5 keV O2+ and 42.4° incidence (in a Cameca IMS 3/4f) reveals some features of the sample that require at least 1 keV O2+ and 60° primary beam incidence to be detected experimentally. © 1998 John Wiley & Sons, Ltd.
    Additional Material: 12 Ill.
    Type of Medium: Electronic Resource
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