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  • 1
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 78 (2001), S. 2885-2887 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The film thickness-dependent imprinting behavior (voltage shift) of (Pb, La)(Zr, Ti)O3 capacitors was evaluated by a thermal stress process under a remanence bias. The remanent polarization (Pr) was found to be almost independent of the film thickness whereas in the 50–300 nm range the relative dielectric constant (cursive-epsilonr) increased linearly with the square root of the film thickness. It was found that the voltage shift, which was attributed to the accumulation of charged defects near the electrode interface, also increased linearly with increasing film thickness. In addition, the charge accumulated thickness varied with the square root of the film thickness. This was established from a simple assumption that the level of charge accumulation is determined by the product of the total amount of charged defects (total film thickness×charged defect density) and the internal field that is generated by the Pr. Therefore, the imprint is much more a bulk-related degradation phenomenon compared to the fatigue. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Westerville, Ohio : American Ceramics Society
    Journal of the American Ceramic Society 82 (1999), S. 0 
    ISSN: 1551-2916
    Source: Blackwell Publishing Journal Backfiles 1879-2005
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: The oxidation behavior of reaction-bonded silicon carbide (RBSC) and the effect of oxidation on the room-temperature flexural strength of RBSC were investigated. Four different types of RBSC, each having various SiC particle-size distributions and free silicon contents, were exposed to air at 1300°C for up to 200 h. Parabolic weight gains, with respect to oxidation time, were observed in all the specimens. The strength of the RBSC increased after oxidation for up to 50 h, because of the blunting of cracks by the silica layer that was formed on the surface. However, with further oxidation, the beneficial role of the oxide layer was negated by the cracks that were newly generated on the surface because of the thermal mismatch between the substrate and the silica layer. The amount of free silicon had a negligible effect on the strength retention of the specimens after the oxidation processes.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Key engineering materials Vol. 214-215 (July 2001), p. 55-60 
    ISSN: 1013-9826
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Type of Medium: Electronic Resource
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