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Permeation of hydrogen into silicon during low-energy hydrogen ion beam bombardment (1987)

Horn, M. W. ; Heddleson, J. M. ; Fonash, S. J.

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 51 (1987), S. 490-492

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ISSN: 1077-3118

Source: AIP Digital Archive

Topics: Physics

Notes: In this study we examine the permeating of hydrogen into p-type silicon during low-energy hydrogen ion beam bombardment by monitoring boron doping deactivation. This examination is done for various times and two different exposure temperatures. In addition we explore the effect of temperature during subsequent isochronal anneals on the recovery of silicon exposed to a hydrogen ion beam. As a result of these studies, it is found that there are two distinct permeation regions. Each may be characterized by its own apparent diffusion coefficient, activation energy, and recovery process.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.98376

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Dry-developed organosilicon resists for 193-nm excimer laser lithography (1992)

Kunz, R. R. ; Horn, M. W.

Stamford, Conn. [u.a.] : Wiley-Blackwell

Polymer Engineering and Science 32 (1992), S. 1595-1599

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ISSN: 0032-3888

Keywords: Chemistry ; Chemical Engineering

Source: Wiley InterScience Backfile Collection 1832-2000

Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics

Notes: Irradiation of certain organosilicon polymers with a 193-nm excimer laser forms a latent image that contains increased amounts of oxygen. Patterning is achieved by dry development in an HBr plasma, where the oxidized polymer etches more slowly than the unexposed areas. With these polymers as the top layer in a bilayer resist scheme, 0.2 μm resolution has been demonsrated and resist sensitivities less than 50 mJ/cm2 have been achieved. Three classes of organosilicon layers have been investigated: polysilynes; polysilanes, in particular poly(phenylmethyl) silane; and a plasma-deposited polymer derived from tetramethylsilane (PPTMS). The PPTMS, when used with plasma-deposited planarizing layers, opens the possibility of an all-dry, cluster-tool-compatible lithographic cycle.

Additional Material: 7 Ill.