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  • 1
    ISSN: 1436-5073
    Keywords: ion implanation ; depth profile analysis ; II/VI semiconductors ; MOVPE ; EPMA
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Abstract In the present work EPMA combined with Monte Carlo simulation was applied to investigate implanted gallium depth distributions in ZnSxSe1−x layers. The layers of about 1 to 4 μm thickness were grown by MOVPE on (100)-GaAs substrate. The overlap of the Ga and zinc L X-ray spectra and the low gallium net count rates were overcome by stripping the spectra of non implanted layers and by applying appropriate beam currents and counting times. Capabilities and limitations of the EPMA technique as applied to depth profile analysis are demonstrated. Despite the mentioned L interference, the detectability limit of EPMA for 340 keV Ga in ZnSxSe1−x is as low as 1014 cm−2. The measured Ga Lα intensity versus beam energy curves reveal variations of the Ga depth profiles during annealing. Evaluation of the intensity curves by means of Monte Carlo simulations yields the implanted dose densities and the first two moments of the depth distributions, i.e. the projected range and its standard deviation. The nonannealed profiles agree well with expectations, but after thermal annealing the profiles were significantly shifted towards the surface. Comparison of EPMA and SIMS results with the example of a non annealed profile in ZnSe has shown good agreement.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Microchimica acta 132 (2000), S. 377-382 
    ISSN: 1436-5073
    Keywords: Key words: Depth profiling; sputtering; EPMA; electron probe micro analysis; multilayer.
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Abstract.  A common problem in depth profile measurement is the calibration of the depth scale. The new technique of sputter assisted electron probe microanalysis offers the possibility of calculating the composition as well as the depth scale solely from the acquired X-ray intensity data without further information, e.g. sputter rates. To achieve a depth resolution that is smaller than the depth of information of the electron probe, i.e. 0.1–1 μm, special deconvolution algorithms must be applied to the acquired data. To assess the capabilities of this new technique it was applied to a Ti/Al/Ti multilayer on Si under different measurement conditions. Quantitative depth profiles were obtained by application of a deconvolution algorithm based on maximum entropy analysis. By comparison of these profiles with AES depth profiles and AFM roughness measurements, it was shown that the limiting factor to the achievable depth resolution is the occurrence of surface roughening induced by the sputtering process rather than the relatively large depth of information of the electron probe. We conclude that for certain applications sputter-assisted EPMA can be regarded as a valid depth profiling technique with a depth resolution in the nm range.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Springer
    Microchimica acta 101 (1990), S. 161-172 
    ISSN: 1436-5073
    Keywords: EPMA ; HT-superconductor ; quantitative microanalysis of oxygen ; phase analysis
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Abstract The high temperature superconductor YBa2Cu3O7−x has been studied by quantitative electron probe microanalysis (EPMA). After investigation of appropriate standards and choice between three different matrix correction methods this technique provides very accurate analytical results including those for oxygen. The quantitative results even allow the determination of the stoichiometry with deviations less than 2% relative. The application of computercontrolled EPMA is demonstrated by the characterization of the microstructure of a ceramic Y-Ba-Cu-O sample. Finally the properties of copperL 2 andL 3 valence band spectra are presented for compounds with copper in different valence state.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Springer
    Microchimica acta 114-115 (1994), S. 511-523 
    ISSN: 1436-5073
    Keywords: AES ; EPMA ; ICB ; coatings ; Ti-Al-O-N ; A12O3 ; Al-O ; wear resistance ; multilayer ; depth profiling ; quantitative microanalysis ; thin film analysis
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Abstract In order to compare thin-film electron probe microanalysis (EPMA) and Auger electron spectroscopy (AES) regarding reliability in quantifying chemical compositions of Ti-Al-O-N coatings with depth, a multilayer was prepared on a silicon wafer by using reactive ionized cluster beam deposition technique. Within a total thickness of about 25 nm the composition of the multilayer varied step by step from Ti-Al-O-N at the bottom to Al-O at the top. AES and, as an innovation, EPMA crater edge profiling was applied to measure the composition with depth. For quantification special thin-film EPMA techniques based on Monte Carlo simulations were applied. The chemical binding states of Al and Ti with depth were analysed using a high resolution energy analyser (MAC 3) for the AES investigations working in the direct mode. According to the deposition procedure the concentration profiles of the components varied with depth for both AES and EPMA measurements. AES provided a better depth resolution than EPMA. To get a true calibration of the depth scale an in-situ measurement method like an optical interferometry will be required. Assuming that the relative sensitivity factors are available AES depth profiling delivers concentration profiles with good accuracy. The new EPMA application provided quantitative depth profiles concerning concentration and coverage. For EPMA crater edge profiling the coating needs to be deposited on a foreign substrate because depth distributions of elements being present in both the layer and the substrate cannot be resolved. The combination of AES-depth profiling with EPMA crater edge profiling techniques is a powerful tool to analyse heterostructures quantitatively.
    Type of Medium: Electronic Resource
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  • 5
    ISSN: 1436-5073
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 6
    ISSN: 1436-5073
    Keywords: steel ; nitrogen ; microarea ; Auger spectrometry ; electron probe microanalysis ; standards
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    Springer
    Microchimica acta 132 (2000), S. 113-128 
    ISSN: 1436-5073
    Keywords: Key words: SEM; low voltage; spatial resolution; X-ray microanalysis.
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Abstract.  Performing X-ray microanalysis at beam energies lower than those conventionally used (〈 10 keV) is known to significantly improve the spatial resolution for compositional analysis. However, the reduction in the beam energy which reduces the X-ray interaction diameter also introduces analytical difficulties and constraints which can diminish the overall analytical performance. This paper critically assesses the capabilities and limitations of performing low beam energy, high spatial resolution X-ray microanalysis. The actual improvement in the spatial resolution and the reduction in the X-ray yield are explored as the beam energy is reduced. The consequences for spectral interpretation, quantitative analysis and imaging due to the lower X-ray yield and the increased occurrence of X-ray line overlaps are discussed in the context of currently available instrumentation.
    Type of Medium: Electronic Resource
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  • 8
    ISSN: 1436-5073
    Keywords: Key words: AES; EPMA; SNMS; SIMS; glass coating.
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Abstract.  A solar control coating was analysed by different methods of surface analysis with respect to the layer sequence and the composition and thickness of each sublayer. The methods used for depth profiling were Auger electron spectroscopy, electron probe microanalysis, secondary neutral mass spectroscopy and secondary ion mass spectroscopy based on MCs+. The structure of the coating was unknown at first. All methods found a system of two metallic Ag layers, embedded between dielectric SnOX layers. Additionally, thin Ni-Cr layers of 1–2 nm were detected on top of the Ag layers. Thus the detected layer sequence is SnOX/Ni-Cr/Ag/SnOX/Ni-Cr/Ag/SnOX/glass. The Ni:Cr ratio in the nm-thin layers could be quantified by every method, the Cr fraction corresponding to less than one monolayer. We compare the capabilities and limitations of each method in routinely investigating this solar control coating. Importance was attached to an effective investigation. Nevertheless, by combining all methods, measuring artefacts could be uncovered and a comprehensive characterisation of the system was obtained.
    Type of Medium: Electronic Resource
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  • 9
    ISSN: 1436-5073
    Keywords: austenitic CrNi(Mo) steels ; N interdiffusion ; electron probe microanalysis ; divergent beam (Kossel) X-ray technique
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Abstract Parameters of the diffusion of N (up to 0.3 wt.%) in austenitic stainless steels (12 to 19 wt.% Cr, 12 to 16 wt.% Ni, up to 2 wt.% Mo) were determined within the temperature range of 1283–1573K. The small concentration gradients of N were successfully investigated using (1) mechanical serial sectioning technique in combination with either chemical N analysis or X-ray precision lattice parameter determination, and (2) measurements on microsections by means of either electron probe microanalysis or Kossel technique. The diffusion coefficients of N were found to be independent of its concentration. The alloying elements Cr and Mo reduce the N diffusivity in austenitic stainless steels which on the other hand is increased by Ni.
    Type of Medium: Electronic Resource
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  • 10
    ISSN: 1436-5073
    Keywords: nitrogen interdiffusion ; austenitic CrNi(Mo) steels ; electron-probe microanalysis (EPMA) ; Kossel technique ; precision determination of lattice parameters
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Abstract For the determination of diffusion coefficients by using the model “diffusion into a plate” methodical examinations were carried out on samples of austenitic steel that had been nitrided in their marginal zones for 1.5 h at 1523 K. For recording of the concentration of N as a function of the distance from the surface electron-probe microanalysis (EPMA) and the precision determination of the lattice parameters by Kossel technique were applied. Both methods yield comparable results.
    Type of Medium: Electronic Resource
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