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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 2481-2486 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report laser-induced transient grating experiments performed at room temperature on self-supporting p-type porous silicon films with different porosities. With this technique the diffusion of the photocarriers can be studied with a time resolution of some tens of picoseconds. The gratings were created by two interfering pulses of the second-harmonic radiation from an Nd3+:yttrium-aluminum-garnet YAG laser (2.3 eV) and their decay in time was studied by a time-delayed pulse of the fundamental YAG laser frequency (1.15 eV). The observed grating decay time is very fast (hundreds of picoseconds) and shortens with decreasing porosity. Diffusion constants D=45, 24, and 5 cm2 s−1 have been found for the porosities of 64%, 68%, and 73%, respectively. To explain these high values of D we consider a simple kinetic model which takes into account two different types of carriers, delocalized and trapped ones. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 69 (1996), S. 833-835 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The stability of high quantum efficiency, porous silicon (PS) electroluminescent (EL) diodes have been analyzed under pulsed operation. The results show that EL exhausting is due to a charging of the PS network which recovery is thermally activated (Er∼0.4 eV). This suggests a charge trapping mechanism at larger crystallites with low bandgap, inhibiting further injection of carriers. Also, forward current is found to be thermally activated, however, with a distinctly lower activation energy (Ej∼0.1–0.2 eV), possibly related to jumping of carriers over barriers between nearby crystallites. Finally, high current densities may lead to thermal runaway causing permanent damage to the structure. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 3
    ISSN: 1573-4854
    Keywords: wide gap amorphous silicon ; photoluminescence ; electroluminescence
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Abstract A series of samples of hydrogenated amorphous silicon (a-Si:H) was prepared from silane diluted highly with He by the microwave electron-cyclotron-resonance PE CVD. Such a wide gap (E≥2.0 eV) a-Si:H emits room temperature photoluminescence (PL) in the visible region. We attempt to reveal the microscopic origin of this PL by monitoring variations of PL intensity vs frequency of infrared vibrations in the vicinity of 2100 cm−1. We find that oligosilanes -(SiH2)n- act as one type of possible luminescence centres. We report also on room temperature electroluminescence (EL) from p-i-n junctions. Surprisingly, and unlike p-i-n structures from standard a-Si:H, weak EL radiation with external quantum efficiency of the order of 10−5% is emitted under reverse bias only. EL and PL emission spectra resemble strongly each other, except high energy wing of the EL spectrum. This high energy widening indicates the participation of hot electrons in the EL excitation mechanism.
    Type of Medium: Electronic Resource
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  • 4
    ISSN: 1434-6079
    Keywords: PACS. 78.55.Hx Other solid inorganic materials - 61.46.+w Clusters, nanoparticles, and nanocrystalline materials - 78.45.+h Stimulated emission
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract: Silicon nanocrystals were prepared by Si+-ion implantation and subsequent annealing of SiO2 films thermally grown on a c-Si wafer. Different implantation energies (20-150 keV) and doses - cm -2 ) were used in order to achieve flat implantation profiles (through the thickness of about 100 nm) with a peak concentration of Si atoms of 5, 7, 10 and 15 atomic%. The presence of Si nanocrystals was verified by transmission electron microscopy. The samples exhibit strong visible/IR photoluminescence (PL) with decay time of the order of tens of μs at room temperature. The changes of PL in the range 70-300 K can be well explained by the exciton singlet-triplet splitting model. We show that all PL characteristics (efficiency, dynamics, temperature dependence, excitation spectra) of our Si+-implanted SiO2 films bear close resemblance to those of a light-emitting porous Si and therefore we suppose similar PL origin in both materials.
    Type of Medium: Electronic Resource
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