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  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 4 (1984), S. 107-118 
    ISSN: 1572-8986
    Keywords: Negative ions ; positive ions ; etching plasmas ; SF6 ; O2
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract Positive and negative ions of Ar/SF6 and Ar/SF6/O2 plasmas (etching plasmas) and of Ar/O2 plasmas (cleaning plasmas) in Pyrex tubes have been investigated using a mass spectrometer-wall probe diagnostic technique. The measurement of negative ions proved to be a very sensitive method for the detection of wall material. In etching plasmas with small admixtures of SF6, oxygen was found as the only representative of wall material. At larger amounts of SF6, silicon could be detected. In cleaning plasmas with small admixtures of O2 applied to a previously etched Pyrex surface, fluorine was found, indicating the reversal of fluoridation by oxygenation.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 5 (1985), S. 89-89 
    ISSN: 1572-8986
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Springer
    The European physical journal 268 (1974), S. 157-163 
    ISSN: 1434-601X
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract The motion of electrons in high electric fields is of particular interest due to its special experimental phenomena and its problems in theoretical treatment. We examine the spatial relaxation of electron energy distributions theoretically and experimentally. In the theory we assume a negligible elastic energy loss and a simple model for the inelastic collisions. The distribution function can be separated in two factors depending either on the kinetic energyε or on the total energyX=g3+Φ (Φ: potential energy). In application to the energy relaxation we calculate the relaxation of a humped initial energy distribution to a smoothed equilibrium distribution. The corresponding experiment was performed in the positive column of an argon plasma at a pressure of 3.6 · 10−3 Torr. We measured the electron energy distribution as a function of distance from the cathode with a Langmuir probe using the second derivative method. Good agreement was found between the experimental and theoretical distributions.
    Type of Medium: Electronic Resource
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