ISSN:
1013-9826
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
This paper experimentally investigates the micro-structural changes in mono-crystallinesilicon induced by abrasive polishing with abrasive grain size and applied pressure. It was foundthat while the large abrasives of about 15 μm and 300 nm in diameter induce both residualamorphous phase and various residual crystalline structures and dislocations, the finer abrasives ofabout 50 nm in diameter only produce residual amorphous phase in the top subsurface of polishedsilicon. With the fine abrasives, reducing applied pressure reduces the amorphous layer thickness,and a damage-free polishing can be achieved at the pressure of 20 kPa
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/01/57/transtech_doi~10.4028%252Fwww.scientific.net%252FKEM.389-390.504.pdf
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