ISSN:
1432-0649
Keywords:
PACS: 42.40; 42.65; 78.65
Source:
Springer Online Journal Archives 1860-2000
Topics:
Physics
Notes:
Abstract. The photorefractive response to an applied electric field is measured in a photorefractive quantum well, providing evidence in favor of the nonlinear transport in the device due to the hot electrons. The reduced mobility of the hot electrons limits the drift length, and thereby limits fringe overshoot. Thus the nonlinear transport prevents the slowing down of the grating writing rate for increasing fields which is common in bulk photorefractives. The photorefractive phase shift in transverse-field photorefractive quantum wells is measured as a function of the frequency offset between two laser writing beams that generate moving gratings. The two-wave mixing passes through a maximum at an optimum frequency which depends on the magnitude and the sign of the applied dc electric field. The phase shift associated with the moving grating adds or subtracts from the static phase shift induced by hot-electron transport in the semiconductor quantum wells, depending on the sign of the field and the sign of the dominant photocarriers. We observe a linear relationship between the roll-off frequency and the power of the writing beams.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/s003400050716
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