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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 68 (1990), S. 4772-4776 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have observed a very interesting feature in the mid-infrared region of copper-doped semi-insulating liquid encapsulated Czochralski grown GaAs at liquid helium temperature. After gettering copper using backside mechanical damage, the transmittance of this particular feature became much weaker. The first absorption feature occurs at 1182 cm−1 (0.147 eV), the second at 1460 cm−1 (0.181 eV), and the third at 1750 cm−1 (0.217 eV), which is a transition of an electron from the valence of three copper levels. This electronic mode absorption allows us to obtain information about the activation energies of deep-level impurities like Cu and their relative concentration after each process. This electronic mode absorption at multilevels of Cu in GaAs is proposed for the first time using the Fourier transform infrared technique to detect deep-level metal impurities in GaAs.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 72 (1992), S. 82-89 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have demonstrated a stress gettering mechanism in semi-insulating, copper-contaminated gallium arsenide (GaAs) using cathodoluminescence (CL), thermally stimulated current spectroscopy (TSC), and low temperature Fourier transform infrared spectroscopy (FTIR). Cathodoluminescence shows a local gettering effect around dislocation cores in bulk semi-insulating GaAs qualitatively. This gettering result was confirmed by low temperature FTIR data, which show absorption features resulting from the transition of electrons from the valence band to copper levels. The energy level of each absorption shoulder corresponds to the various copper levels in GaAs. After gettering, the absorption depth at each shoulder decreases. Thermally stimulated current measurements show changes after copper doping. The characteristic returns to that of uncontaminated GaAs after gettering. On the basis of these qualitative and quantitative data, we conclude that copper was gettered, and we propose a stress gettering mechanism in semi-insulating, copper-contaminated GaAs on the basis of dislocation cores acting as localized gettering sites.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 60 (1986), S. 3616-3621 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Electrical conduction in ultrathin nitrided oxide films on silicon has been investigated by comparing it with that in ultrathin oxide. Significant current enhancement in the nitrided oxide and partial recovery of the enhancement by O2 annealing were observed, which can be satisfactorily explained by a two-step tunneling via traps generated in the nitrided oxide during nitridation. From the comparison between theoretical calculations of tunneling current and experimental data for the nitrided oxide and the SiO2, it is found that the effective barrier height for electrons at an aluminum-nitrided oxide interface decreases from 3.1 to 2.5 eV for an as-grown nitrided oxide and to 2.75 eV for a nitrided oxide annealed in O2. The nitrogen-related traps are estimated to be situated at the surface portion within 32–34 A(ring) from the metal-insulator interface with the energy level of 2.87 eV for the former and 3.32 eV for the latter below each conduction-band edge.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 71 (1997), S. 359-361 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Spectroscopic ellipsometry was used to monitor excimer laser annealed thin (∼100 nm) amorphous silicon (a-Si) films grown on quartz substrates by low pressure chemical vapor deposition (LPCVD). The peak position of the imaginary part of the complex dielectric function ε2 was used to determine the degree of crystallization of the a-Si. The amplitude of ε2 at the Si E1 transition energy is found to be a good indicator of the polycrystalline silicon (poly-Si) grain size after laser annealing with good correlation between ex situ ellipsometric data and poly-Si grain sizes being observed. Spectroscopic ellipsometry provides a contactless, nondestructive, and simple technique for monitoring laser annealing both in situ during the annealing process or ex situ after annealing. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
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