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  • 1
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    The @journal of organic chemistry 53 (1988), S. 992-995 
    ISSN: 1520-6904
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Hydrogenated amorphous silicon has been prepared at a plasma excitation frequency in the very-high-frequency band at 70 MHz with the glow discharge technique at substrate temperatures between 280 and 50 °C. The structural properties have been studied using hydrogen evolution, elastic recoil detection analysis, and infrared spectroscopy. The films were further characterized by dark and photoconductivity and by photothermal deflection spectroscopy. With respect to films prepared at the conventional frequency of 13.56 MHz considerable differences concerning the electronic and structural properties are observed as the substrate temperature is decreased from 280 to 50 °C. Down to a substrate temperature of 150 °C the electronic film properties change only a little and the total hydrogen content cH and the degree of microstructure that can be directly correlated to cH increase only moderately. Below 150 °C the electronic properties deteriorate in the usual manner but still the total hydrogen content does not exceed 21 at. % even at a substrate temperature of 50 °C. It is argued that the influence of the higher excitation frequency on the plasma and on the growth kinetics plays a key role in this context by allowing a highly effective dissociation of the process gas with the maximum ion energies remaining at low levels. It is concluded that deposition processes at higher excitation frequencies can have important technological implications by allowing a decrease of the deposition temperature without losses in the material quality.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 87 (2000), S. 3137-3142 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A series of samples was deposited by very high frequency glow discharge in a plasma of silane diluted in hydrogen in concentrations SiH4/(SiH4+H2) varying from 100% to 1.25%. For silane concentrations below 8.4%, a phase transition between amorphous and microcrystalline silicon occurs. Microcrystalline silicon has been characterized by transmission electron microscopy (TEM) and x-ray diffraction. The medium-resolution TEM observations show that below the transition, the microstructure of microcrystalline silicon varies in a complex way, showing a large variety of different growth structures. For the sample close to the phase transition, one observes elongated nanocrystals of silicon embedded in an amorphous matrix followed at intermediate dilution by dendritic growth, and, finally, at very high dilution level, one observes columnar growth. X-ray diffraction data evidence a (220) crystallographic texture; the comparison of the grain sizes as evaluated from TEM observations and those determined using Scherrer's equation illustrates the known limitations of the latter method for grain size determination in complex microstructures. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Inorganic chemistry 29 (1990), S. 3037-3041 
    ISSN: 1520-510X
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 4971-4975 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Hydrogen incorporation in silicon layers prepared by plasma-enhanced chemical-vapor deposition using silane dilution by hydrogen has been studied by infrared spectroscopy (IR) and elastic recoil detection analysis (ERDA). The large range of silane dilution investigated can be divided into an amorphous and a microcrystalline zone. These two zones are separated by a narrow transition zone at a dilution level of 7.5%; here, the structure of the material cannot be clearly identified. The films in/near the amorphous/microcrystalline transition zone show a considerably enhanced hydrogen incorporation. Moreover, comparison of IR and ERDA and film stress measurements suggests that these layers contain a substantial amount of molecular hydrogen probably trapped in microvoids. In this particular case the determination of the total H content by IR spectroscopy leads to substantial errors. At silane concentrations below 6%, the hydrogen content decreases sharply and the material becomes progressively microcrystalline. The features observed in the IR-absorption modes can be clearly assigned to mono- and/or dihydride bonds on (100) and (111) surfaces in silicon crystallites. The measurements presented here constitute a further indication for the validity of the proportionality constant of Shanks et al. [Phys. Status Solidi B 110, 43 (1980)], generally used to estimate the hydrogen content in "conventional'' amorphous silicon films from IR spectroscopy; additionally, they indicate that this proportionality constant is also valid for the microcrystalline samples. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 5111-5115 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Hydrogenated microcrystalline silicon (μc-Si:H) deposited by VHF plasma-enhanced chemical vapor deposition has recently been proven to be fully stable, with respect to light-induced degradation, when adequately used in p-i-n solar cells. Stable solar cells efficiencies of 7.7% have been obtained with single-junction cells, using "midgap'' microcrystalline i-layers, having an optical gap of around 1 eV. In the present paper, the electronic transport properties of such microcrystalline layers are determined, by the steady-state photocarrier grating method (SSPG) and steady-state photoconductivity measurements, in a coplanar configuration. The conditions for the validity of the procedure for determining the ambipolar diffusion length, Lamb, from SSPG measurements (as previously theoretically derived in the context of amorphous silicon) are carefully re-examined and found to hold in these μc-Si:H layers, taking certain additional precautions. Otherwise, e.g., the prevalence of the "lifetime'' regime (as opposed to the "relaxation time'' regime) becomes questionable, in sharp contrast with the case of amorphous semiconductors, where this condition is almost never a problem. For the best layers measured so far, Lamb is about twice as high and the photoconductivity σphoto four times as high in μc-Si:H, when compared to device quality a-Si:H. Until now, the highest values of Lamb found by the authors for μc-Si:H layers are around 3×10−5 cm. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 6050-6059 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Reasonable consistency between experimental data for the ambipolar diffusion length and experimental data for the photoconductivity is demonstrated for steady-state measurements performed on a-Si:H layers. This consistency is obtained based on the "standard'' defect model for a-Si:H. In this model the dangling bonds are taken into account, considering their amphoteric behavior and treating then as recombination centers, whereas the band tails are taken into account as simple two-valued defects acting as traps. Consistency is obtained based on (1) a particular form of the recombination function such as is considered appropriate for the dangling bonds, as well as, additionally, (2) the local charge neutrality condition. The experimental data analyzed are power laws of the ambipolar diffusion length and of the photoconductivity (versus light intensity); they are obtained for a series of slightly p and n-doped samples including the undoped case. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 712-716 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Microcrystalline silicon (μc-Si:H) layers deposited by the very high-frequency-glow discharge technique at a radio-frequency excitation of 70 MHz are observed to be basically slightly 〈n〉 type. By doping (so-called "microdoping'') with boron in the gas phase volume part per million (vppm) range, compensated material could be obtained. The influence of this doping on the electronic transport properties is documented. A pronounced onset of the boron incorporation into the films measured by secondary-ion-mass spectrometry is observed around 3 vppm (B2H6/SiH4), together with marked changes in the electrical properties. The compensated film obtained for a microdoping of about 1 vppm shows the lowest dark conductivity [3×10−8 (Ω cm)−1], the highest activation energy (517 meV), and, finally, the highest photoconductive gain of 6×103 (photo/dark current ratio). Depending on the value of the activation energy (the critical value is ≈0.2 eV), two different transport models are identified, corresponding to "Meyer–Neldel'' or "anti-Meyer–Neldel'' behavior. As for light-induced degradation, the compensated film exhibits better stability than undoped films. Finally, the use of slightly boron doped μc-Si:H as photovoltaically active material will be discussed. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 1722-1726 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Variation of both photoconductivity σph and ambipolar diffusion length Lamb have been measured during exposure to light on a series of lightly p- and n-doped a-Si:H samples. The observed decay of the photoconductivity with time of exposure has been fitted by a power-law function. The power-law exponent observed strongly depends on doping. On the other hand, ambipolar diffusion length generally remains constant during the observed part of the degradation process, except for a slightly boron-doped sample with the Fermi-level near midgap. In the latter, Lamb decreases in accordance with σph. The experimental observations can be qualitatively explained taking into account dangling bonds with their three charge states (D+,D0,D−) as main recombination centers.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 9361-9368 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The missing correlation between film characteristics and a-Si:H-based p-i-n solar cells is still a controversial subject. The authors present a new parameter μ0τ0, evaluated from steady-state transport measurements on a-Si:H layers, which can indeed relate film quality and cell performance as far as the latter is limited by the quality of the intrinsic 〈i〉 layer. Thereby, two specific features of the evaluated μ0τ0 product can explain its successful role as a quality parameter for a-Si:H: First, the computation of μ0τ0 takes into account the effects of the prevailing dangling bond occupation, which is very different in uniform films as compared to the occupation profile prevailing through the i layer of a p-i-n solar cell; second, the evaluated μ0τ0 product combines information about band mobility and defect density; furthermore it avoids some of the well-known pitfalls of usual deep defect density measurements such as constant photocurrent method and photothermal deflection spectroscopy. Experimental data on a series of layers and p-i-n solar cells illustrates the determination of μ0τ0 in a given practical case and its successful correlation with cell efficiency. In this context, an estimation for the ratio of charged to neutral capture cross sections σ±/σ0 of around 50 is found. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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