ISSN:
0032-3888
Keywords:
Chemistry
;
Chemical Engineering
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
A new positive-working photosensitive system of silicon polymer, containing silylether groups in the main chain and a photo-induced acid precursor was investigated. The silicon polymer is hydrolized by a photogenerated acid and degraded to low molecular weight compounds. Thus the effect of solubility inhibition of the polymer is diminished. The higher photosensitivity of this system as compared with 1,2-quinone diazide compounds is due to the catalytic reaction of the acid on the hydrolysis of the silicon polymer. The chemical structure around silylether groups in the polymer, in particular more hydrophilic and less steric structures, affects the rate of hydrolysis and thus the photosensitivity. Among various types of photo-induced acid precursors examined, e.g., s-triazine and 1,3,4-oxadiazole compounds substituted by trihalomethyl groups were effective.
Additional Material:
9 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/pen.760291312
Permalink
