ISSN:
0032-3888
Schlagwort(e):
Chemistry
;
Chemical Engineering
Quelle:
Wiley InterScience Backfile Collection 1832-2000
Thema:
Chemie und Pharmazie
,
Maschinenbau
,
Physik
Notizen:
A new positive-working photosensitive system of silicon polymer, containing silylether groups in the main chain and a photo-induced acid precursor was investigated. The silicon polymer is hydrolized by a photogenerated acid and degraded to low molecular weight compounds. Thus the effect of solubility inhibition of the polymer is diminished. The higher photosensitivity of this system as compared with 1,2-quinone diazide compounds is due to the catalytic reaction of the acid on the hydrolysis of the silicon polymer. The chemical structure around silylether groups in the polymer, in particular more hydrophilic and less steric structures, affects the rate of hydrolysis and thus the photosensitivity. Among various types of photo-induced acid precursors examined, e.g., s-triazine and 1,3,4-oxadiazole compounds substituted by trihalomethyl groups were effective.
Zusätzliches Material:
9 Ill.
Materialart:
Digitale Medien
URL:
http://dx.doi.org/10.1002/pen.760291312
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