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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 85 (1999), S. 571-577 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A comparison has been made between the Al via fill mechanisms in both reflow and forcefill processes. Cross-sectional transmission electron microscopy has been used to study the Al transport into the vias as a function of time. Our analysis shows that reflow and forcefill results can be explained by a stress relaxation model. We propose that the transport of aluminum into the vias as a function of time is described by both diffusion and dislocation movement. In the case of reflow at high temperature, the vias may be filled completely, after closure, by high-temperature creep of Al. In the case of forcefill, an additional high stress has been applied which raises the strain levels such to activate the dislocation glide and climb mechanism. The results from detailed investigations of the microstructure by cross-sectional transmission electron microscopy support these new insights. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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