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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 66 (1989), S. 856-860 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The damage of Sn-doped InP by Ga ion implantation with fluences ranging from 1×1013 to 5×1014 cm−2 and annealing effects (150–650 °C) are investigated by means of Raman scattering. The shift and asymmetrical broadening of a longitudinal optical phonon peak and the appearance of transverse optical mode and disorder-activated acoustic modes show that the damage effect by Ga ion implantation is very large, and the crystalline structure becomes amorphouslike at a fluence as low as 1×1014 cm−2. The damaged state is investigated in terms of the spatial correlation model and quantitatively estimated by comparing the Raman peaks for longitudinal optical and transverse acoustic phonon modes with the theoretical calculations. It is shown that the correlation lengths at 1×1013 cm−2 are 36 and 29 A(ring), respectively. This largely damaged structure is found to be recovered by annealing at as low as 250 °C.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 70 (1991), S. 204-208 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Interdiffusion process of InGaAs/InP superlattice structures by thermal annealing of 700–850 °C is studied by Raman spectroscopy. Peak intensities and peak energies of InAs-, GaAs-, and InP-like longitudinal optical (LO) phonon modes change with thermal annealing temperature and time. Depth profiles of the group III and group V atoms are estimated quantitatively by measuring the variations of the peak energies of the LO phonon modes and the ratios of the mode intensities. The energy shift of the GaAs-like LO peak showing a small broadening, the existence of nonenergy shift InP LO phonon peak and the emerging of InP-like LO peak in the lower energy region indicate that the interdiffused superlattice consists of uniform compositional InGaAsP well and InP barrier layers and sharp interfaces. It is found that the resulting InGaAsP quaternary alloy is roughly lattice-matched to InP (〈±0.5%). It is also found that the diffusion coefficient in the well region is larger than that in the barrier region, and that the interdiffusion coefficient D0 and activation energy Ea are 8.56×1010 cm2/s and 5.82 eV, respectively. The interdiffusion in this superlattice is determined by the diffusion in the InP region.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 58 (1991), S. 1407-1409 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Short period GaP/AlP superlattices are grown on GaP and GaAs substrates at 600 °C by gas source molecular beam epitaxy with growth interruption. Alternating monolayer growth of GaP and AlP is confirmed by the observation of the reflection high-energy electron diffraction intensity oscillations during growth. The formation of short period superlattice structures and the zone-folded LO phonons are observed in the x-ray diffraction rocking curves and Raman spectra, respectively.
    Type of Medium: Electronic Resource
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