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  • 1
    Electronic Resource
    Electronic Resource
    Air microwave-induced plasma: Detection of NO in the post-discharge using an ArF laser (1993)
    Springer
    Plasma chemistry and plasma processing 13 (1993), S. 351-364 
    Details
    ISSN: 1572-8986
    Keywords: Air microwave plasma ; laser-induced fluorescence ; temperature ; nitrogen monoxide density
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract ArF laser-induced fluorescence (LIF) spectroscopy was applied to the investigation of the density of NO achieved in the post-discharge of an N2-O2 microwave-induced plasma (2450 MHz). The fluorescence spectrum provides a determination of NO vibrational temperature downstream the discharge. Absolute concentration profiles were determined in the low-temperature region of the post-discharge.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01466049
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  • 2
    Electronic Resource
    Electronic Resource
    A kinetic study of methane conversion by a dinitrogen microwave plasma (1994)
    Springer
    Plasma chemistry and plasma processing 14 (1994), S. 229-249 
    Details
    ISSN: 1572-8986
    Keywords: Nitrogen microwave plasma ; methane conversion
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract Conversion of CH4 with a N2 microwave plasma (2.45 GHz) is studied. The experiments cover the absorbed microwave power range 300–700 W with 17–62% of methane in the gas mixture, with pressures of 10–40 mbar and flow rates of 140–650 ml· min−1. The yields of C2 hydrocarbons and dihydrogen are analyzed by gas chromatography. The distance of methane addition downstream of the plasma plays an important role on the composition and the concentration of the products obtained. This distance mainly determines the energy concentrated in the active species of the plasma when they react with methane. Different behaviors for acetylene formation, on the one hand, and for ethane and ethene formation, on the other hand, have been observed, and this finding allows us to propose a kinetic mechanism for the decay of methane and for the formation of C2 hydrocarbons.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01447080
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  • 3
    Electronic Resource
    Electronic Resource
    Air microwave-induced plasma: Relation between ion density and atomic oxygen density (1993)
    Springer
    Plasma chemistry and plasma processing 13 (1993), S. 103-116 
    Details
    ISSN: 1572-8986
    Keywords: Air microwave plasma ; ion density ; oxygen atom density
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract Electron temperature and ion density are measured in an air microwave-induced plasma (2450 MHz) by means of a floating double probe. A 'cinetic scheme for ion formation and decay is set up, and a relationship between atomic oxygen and ion densities is obtained. From this relationship an order-of-magnitude of atomic oxygen concentration in the discharge is derived and compared with results obtained by optical actinometry in another work.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01447173
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  • 4
    Electronic Resource
    Electronic Resource
    Surface oxidation by microwave-induced plasma of candidate composite materials for space shuttle protection (1990)
    Springer
    Journal of materials science 25 (1990), S. 4113-4119 
    Details
    ISSN: 1573-4803
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Abstract Oxidation resistance of composite materials (SiC/SiC, C/SiC and C/C) which can be used to protect shuttles is studied in oxygen microwave-induced plasmas (MIP). These plasmas contain the same energetic species (electrons, ions, radicals, excited atoms or molecules) as those produced by the shock wave resulting from re-entry into the atmosphere. The plasma is sustained in a silica tube located in a resonant cavity and microwave energy is supplied by a generator operating at 2450 MHz with variable power from 15 to 1000W. Experiments are conducted at pressures from 100 to 1000 Pa with temperature ranging from 1100 to 1300 °C. The atomic oxygen flow rate is about 6.1019 at sec−1 cm−2. The wafers are exposed to the plasma for 10 to 25 h for periods of 15 or 30min. Kinetic behaviour of the material is studied by gravimetry and surface characteristic modifications are analysed by BET Krypton isotherms at 77 K and electron spectroscopy for chemical analysis (ESCA). Gravimetric results, measurements of specific surface area by krypton adsorption and ESCA analysis show that the samples of SiC/SiC and C/SiC are quite resistant to the oxygen plasma even after 25 h exposure. The mass loss is small and the specific surface area (BET) increases but is always lower than 1 m2 g−1. ESCA analysis shows that the surface evolves by change of the superficial silicon carbide into silica. The C/C samples behave quite differently: without any protection they disappear in less than 5 min. With an antioxidant protective layer, this material can be oxidation resistant. The BET and ESCA measurements show that the attack leads to a sintering of the silica which gathers on the fibres, reducing the protection of the matrix.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00582490
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  • 5
    Electronic Resource
    Electronic Resource
    Determination of the gas-phase decomposition rate constants of heptyl-1 and heptyl-2 hydroperoxides C7H15OOH (1982)
    New York, NY : Wiley-Blackwell
    International Journal of Chemical Kinetics 14 (1982), S. 1325-1337 
    Details
    ISSN: 0538-8066
    Keywords: Chemistry ; Physical Chemistry
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Notes: The gas-phase decomposition of n-heptyl-1 and n-heptyl-2 hydroperoxides C7H15OOH, which split into two radicals C7H15O and OH, has been investigated in the temperature range of 250-360°C. The decomposition has been carried out in a hydrogen-oxygen mixture (the hydroperoxide represents about 50 ppm) so as to avoid secondary reactions between the formed radicals and the reactants. Although the H2-O2 mixture is not spontaneously reactive in our conditions, it operates the transformation, through a fast and well-known process, of the OH radicals into HO2 radicals and then into H2O2. However, C7H15O radicals are also transformed into HO2 radicals and then into H2O2, but through an unknown process. To avoid heterogeneous reactions, vessel and probe are coated by B2O3 and then treated by the slow combustion of hydrogen at 510°C and 250 torr before the experiments are performed. As the reaction scheme is very simple, due to the use of the H2-O2 mixture, the determination of the evolutions of the HO2 concentration (followed by electronic paramagnetic resonance) lead to the determination of the gas-phase decomposition rate constant of hydroperoxides. For the n-heptyl-1 hydroperoxide the rate constant is \documentclass{article}\pagestyle{empty}\begin{document}$$(1.1 \pm 0.25) \times 10^{16} \exp - \left({\frac{{43,500 \pm 1000}}{{RT}}} \right){\rm s}^{{\rm - 1}}$$\end{document} and for the n-heptyl-2 hydroperoxide it is \documentclass{article}\pagestyle{empty}\begin{document}$$(7 \pm 2) \times 10^{15} \exp - \left({\frac{{41,500 \pm 1000}}{{RT}}} \right){\rm s}^{{\rm - 1}}$$\end{document}.
    Additional Material: 6 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/kin.550141205
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    Paper (German National Licenses)
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