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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 85 (1999), S. 490-497 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Zinc selenide films were doped with phosphorus during molecular beam epitaxial (MBE) growth by employing a novel, valved, three-zone solid-source radio frequency (rf)-cracker unit manufactured by Oxford Applied Research (OAR). Optical emission spectroscopy analysis of the plasmas produced in the rf chamber of the unit showed that the apparatus was capable of generating a flux of atomic phosphorus. By suitably adjusting the operating conditions of the unit, phosphorus concentrations in ZnSe epilayers were varied over the range of 1×1016 cm−3 to high-1018 cm−3, in a highly controlled and reproducible fashion. Phosphorus atoms, in contrast to P4 molecules, were found to be highly chemically reactive at the growing ZnSe surface at a normal growth temperature (around 300 °C), and the OAR unit was found to be eminently suitable for the provision of atomic P for MBE growth. Doping using atomic P was found, at least in lightly to moderately doped ZnSe, to provide an acceptor state that gave rise to a neutral-acceptor bound exciton emission located at 2.7919 eV, in keeping with that of other substitutional acceptors in ZnSe. Also, compensation in atomic P doped ZnSe appears to occur by virtue of the formation of shallow donor states rather than via the production of deep level states, which dominate in the case of most of the previously reported phosphorus-doped ZnSe studies. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have determined that the surface stoichiometry maintained during the first five monolayers of ZnSe epitaxial growth can have a significant influence on the stacking fault concentration in 2 μm thick epilayers. In particular, we have been able to minimize the stacking fault concentration to a level in the 104 cm−2 range (comparable to the stacking fault concentration in the ZnSe substrates used for epitaxy) by appropriate selection of a delay time (∼30 s for a substrate temperature of 300 °C) employed during an alternate element (Zn and Se) exposure phase of growth. The delay time in question is the time elapsed between closing the Se shutter and opening the Zn shutter. We show that the surface stoichiometry (Zn to Se atomic ratio) can be tailored during the delay phase since Se thermal desorption occurs at the growth temperature in a controlled fashion from an initially Se-terminated surface, and, it is postulated that selection of an optimum delay time corresponding to the attainment of a near-stoichiometric surface results in the growth of low stacking fault concentration material. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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