ISSN:
1433-3058
Keywords:
Keywords. Film thickness control; Hybrid networks modelling; LPCVD reactor; Temperature control
Source:
Springer Online Journal Archives 1860-2000
Topics:
Computer Science
,
Mathematics
Notes:
In this paper, a new approach of LPCVD reactor modelling and control is presented, based on the use of neural networks. We first present the development of a hybrid networks model of the reactor. The objective is to provide a simulation model which can be used to compute online the film thickness on each wafer. In the second section, the thermal control of a LPCVD reactor is studied. The objective is to develop a multivariable controller to control a space- and time-varying temperature profile inside the reactor. A neural network is designed using a methodology based on process inverse dynamics modelling. Good control results have been obtained when tracking space-time temperature profiles inside the LPCVD reactor pilot plant. Finally, global software is elaborated to achieve film thickness control in an experimental LPCVD reactor pilot plant, in order to get a defined and uniform deposition thickness on the wafers all along the reactor. Experimental results are presented which confirm the efficiency of the optimal control strategy.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/s005210070010
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