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  • 1
    Electronic Resource
    Electronic Resource
    Matrix calibration for the quantitative analysis of layered semiconductors by secondary ion mass spectrometry (1983)
    s.l. : American Chemical Society
    Analytical chemistry 55 (1983), S. 2051-2055 
    Details
    ISSN: 1520-6882
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1021/ac00263a010
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    Paper (German National Licenses)
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  • 2
    Electronic Resource
    Electronic Resource
    Point-by-point matrix effect calibration for the quantitative analysis of superlattices by secondary ion mass spectrometry (1984)
    s.l. : American Chemical Society
    Analytical chemistry 56 (1984), S. 74-77 
    Details
    ISSN: 1520-6882
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1021/ac00265a020
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    Paper (German National Licenses)
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  • 3
    Electronic Resource
    Electronic Resource
    Properties of micrometer-thick plasma-polymerized tetrafluoroethylene films (1991)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 70 (1991), S. 2326-2332 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Several physical properties of thin plasma-polymerized films have been measured using a new fiber-optic-based technique. Films of plasma-polymerized tetrafluoroethylene (PPTFE) deposited on the end of an optical fiber form an optical cavity, the reflectivity of which is very sensitive to the film thickness. The fiber is used as an in situ monitor of the deposition rate in the plasma and, after removal from the plasma, the mechanical properties of the film can be measured. With this measurement technique the thermal expansion of the film normal to its surface as well as the swelling of the film when exposed to an array of organic solvents have been determined. A significantly smaller thermal-expansion coefficient and larger degree of swelling are observed relative to bulk PTFE. X-ray photoelectron spectroscopy measurements show that the fluorocarbon chains are highly branched and have a fluorine-to-carbon ratio of 1.45. These results suggest that the plasma-polymerized films are not crystalline and are heavily cross linked.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.349428
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    Paper (German National Licenses)
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  • 4
    Electronic Resource
    Electronic Resource
    Surface characterization of EVA copolymers and blends using XPS and ToF-SIMS (1994)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 21 (1994), S. 703-710 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: The surface chemistries of semi-crystalline copolymers of ethylene (CH2=CH2) and vinyl acetate (CH2=CHCO2CH3) (EVAs) and blends of these copolymers with low-density polyethylene (LDPE) have been examined critically for the first time using angle-resolved XPS and time-of-flight SIMS (ToF-SIMS) analyses. Specimens were fabricated using a variety of methods (commercial extrusion, spin coating and thermal compression) to determine the influence of processing conditions on EVA surface chemistry. The XPS and ToF-SIMS analysis of these specimens has provided techniques for identifying surface EVA (also thermal oxidation), has provided both XPS and ToF-SIMS methods for quantitative EVA analysis and has revealed the details of EVA surface chemistry. The XPS core-level spectra indicate the presence of the ester (VA) and ether (surface oxidation) species, but do not provide positive EVA identification. The ToF-SIMS spectra show features specific to both the ethylene and vinyl acetate portions of the polymer. Both XPS and ToF-SIMS analyses have been calibrated to provide quantitative VA (error 〈 2 wt.% VA) and oxygen (error 〈 1.0 at.% oxygen) analyses. Surface VA content was found to increase linearly with bulk VA content, and was not influenced by the type of fabrication method used. The EVA surfaces appear to consist of two layers. The near-surface region (〉 20 Å depth) is dominated by a VA-poor (ethylene-rich) layer. This region is covered by a thin (≤20 Å thick) VA-enriched layer.
    Additional Material: 10 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740211005
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    Paper (German National Licenses)
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  • 5
    Electronic Resource
    Electronic Resource
    SIMS matrix effects in Alx Ga1 - xAs: Influence of instrumental parameters (1989)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 14 (1989), S. 31-38 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: The influence of instrumental parameters on the matrix effects (ion and sputtering yield variations) observed in AlxGa1 - xAs are critically evaluated. Ion and sputtering yield data from three different SIMS instruments (ARL IMMA, Cameca IMS-3F and Atomika SIMS) are examined. The influence of primary ion (O2 +) energy and incident angle on the extent of surface oxidation was examined using AES. Although relative ion yields varied linearly with the matrix composition in all instances, these ion yield variations differed greatly (a factor of 50) between instruments. These differences were attributed to differences in the surface oxygen concentrations produced by the SIMS instruments. AlAs was shown to be completely oxidized under each of the SIMS ion bombardment conditions. However, the oxygen levels incorporated in GaAs and the other Al poor specimens depended largely on the incident angle and to a lesser extent on the ion energy. Small incidence angles (normal incidence) promoted the most extensive oxidation of the Al-poor specimens, resulting in the smallest ion yield variations with matrix. As with the relative ion yields, relative sputtering yields varied linearly with the matrix composition in all instances. However, in contrast to relative ion yields, the relative sputtering yields did not change significantly under the different instrumental conditions. It was concluded that incident angle and ion energy had approximately the same influence on the sputtering yields obtained from the reference and the sample matrices. Thus, the relative sputtering yields were insensitive to changes in these ion beam parameters.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740140109
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    Paper (German National Licenses)
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  • 6
    Electronic Resource
    Electronic Resource
    Detection limit for carbon in InSb during SIMS depth profiling (1991)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 17 (1991), S. 15-21 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Secondary ion mass spectrometry (SIMS) is commonly used to determine the depth distribution of carbon in semiconductors. Carbonaceous residual gases in SIMS insturumentation and memory effects associated with carbon redeposition within the sputtered craters normally limit the detectability of carbon to ∼ 1 × 1017 C cm-3. In this investigation, the effects of primary ion (Cs+ and O2+), primary ion current (also current density), secondary ion, secondary ion energy discrimination, cryogenic cold finger and vacuum on the SIMS analysis of carbon in InSb were examined and optimized. Under optimized analysis conditions, the detection limit for carbon was reduced to ∼ 1 × 1016 C cm-3. Detection of the 123SB12C- molecular ion rather than 12C- was found to increase the sensitivity to carbon by ∼ 3 ×. In addition, 123Sb12C- was found to be less sensitive to carbon contamination present on as-received surfaces or incorporated from the analytical environment.
    Additional Material: 8 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740170106
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  • 7
    Electronic Resource
    Electronic Resource
    Force Modulation AFM of Elastomer Blends: Morphology, Fillers and Cross-linking (1997)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 25 (1997), S. 418-429 
    Details
    ISSN: 0142-2421
    Keywords: AFM ; elastomer ; morphology ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: In order to determine and optimize structure-property relationships in polymer blends, a knowledge of microscopic morphology and physical properties is essential. However, much of this microscopic morphology and physical property information has not been readily available using conventional characterization techniques. In this work, the capability of force modulation atomic force microscopy (AFM) for determining the detailed microstructure and physical properties of industrial polymer blends is evaluated for the first time. When combined with cryogenic facing, force modulation mapping is shown to be a very valuable microcharacterization technique that has a wide range of applicability. The modulus contrast obtained in the analysis of blends and composites allows one to distinguish polymer phases and related morphology with ease and with good specificity. This capability is demonstrated on a variety of filled and unfilled elastomer/plastic and elastomer/elastomer blends. In addition, analyses are successfully performed on a variety of blends containing isobutylene-based polymer that cannot be unambiguously characterized by electron microscopy techniques (isobutylene-based polymers rapidly degrade under electron bombardment). Force modulation mapping is also shown to be quite useful in distinguishing different types of fillers and their distributions in different polymer domains. Moreover, the capability of force modulation mapping for determining microscopic changes in cross-link density is examined. Examples of cross-linking mapping are presented for NR/BIMS, PP/EPDM and BIMS/BR blends. Finally, a semiquantitative calibration of relative force modulation amplitude vs. NR cure state is presented. All of these types of analyses are obtained without a need for the topographical contrast required by conventional AFM techniques and without the need for the complicated and time-consuming etching, staining and cryosectioning (thin films) typically required by electron microscopy techniques. © 1997 John Wiley & Sons, Ltd.
    Additional Material: 12 Ill.
    Type of Medium: Electronic Resource
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