ISSN:
1662-9752
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
In this paper, ZnO films are deposited on Freestanding Thick Diamond (FTDF) byplasma-assisted Metal Organic Chemical Vapour Deposition (MOCVD). Diethyl zinc, O2, and N2Oare applied as precursors and different substrate temperatures are used to achieve high quality ZnOfilms. The influence of substrate temperature on the properties of ZnO films is systematicallyinvestigated by X-ray diffraction, Hall measurements, and electron probe microanalysis.Experimental results demonstrate that ZnO films deposited at 600°C and 73Pa displays fine electricalquality and Zn/O atomic ratio plays an important role in the electrical property of ZnO films
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/02/18/transtech_doi~10.4028%252Fwww.scientific.net%252FMSF.561-565.2423.pdf
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