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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 1807-1812 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The lock-on effect—observed in high-power GaAs and InP photoconductive switches—is characterized by a high on-state conduction current resulting from a high gain switching mechanism. In our study, an analytical model has been developed to determine the fundamental limitations to device performance imposed by this effect on high-power switching devices. In this model, a regional approximation is used to calculate the field distribution in the device and to obtain the device's current density-voltage (J-V) characteristics. It is shown that negative resistance gives rise to high-field avalanche injection at the anode boundary. Moreover, the analytical results indicate the importance of electron velocity saturation for the onset of negative resistance, as well as the effect of hole injection from the high-field anode region on voltage lowering across the switch. It is determined that lock-on is associated with the transferred-electron effect, and will therefore constrain the use of GaAs and InP as materials for high-power switching devices.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 3586-3592 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A study is performed to assess Si and GaAs as materials for realization of repetitive, high-energy, pulsed switches in applications where the switching parameters are blocking voltages (VB) exceeding 1 kV in the off state and conduction currents (IF) in excess of 500 A in the on state, the current risetime being less than 1 μs and the pulse length being longer than 50 ns. Theoretical and technological limitations associated with the switching characteristics of Si- and GaAs-based majority carrier (unipolar) and minority carrier (bipolar) devices in the low-field, high-mobility, and high-field velocity saturation regimes are analyzed and discussed. It is concluded that for medium power applications (VBIF〈300 kW,VB(approximately-greater-than)1 kV), majority carrier devices are best suited for fast switching processes in the low-field, low current density (J〈100 A/cm2) regime. Under such conditions, the high drift mobility of GaAs allows for realization of field-effect devices exhibiting fast switching speeds and low on-state conduction losses. For pulsed switching in the high-power regime (300 kW〈VBIF〈30 MW, VB(approximately-greater-than)1 kV), bipolar structures exhibit the most desirable characteristics, while compared to their Si counterparts, the on-state conduction losses of GaAs-based devices are extremely high. These considerations are extended to stacked Si bipolar devices and semi-insulating GaAs photoconductive switches for ultrahigh-power ((approximately-greater-than)30 MW) switching applications.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 63 (1988), S. 5040-5043 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Hydrogen ion implantation was carried out on Schottky diodes having large difference in metal work function, Ti/p-Si and PtSi/p-Si diodes. Current-voltage (I-V) measurements showed that, following ion implantation, Ti/p-Si diodes exhibited rectifying characteristics; in contrast, no significant rectifying behavior was observed in the PtSi/p-Si diodes. These results showed a dependence of the implantation effects upon metal overlayer work functions. Consequently, the observations did not seem to indicate the occurrence of Fermi level pinning due to a highly damaged near-surface region after ion implantation, as previously suggested. Capacitance-voltage (C-V) measurements revealed a decrease in the diode capacitances along with a significant reduction of acceptor concentration following the implantation. In general, the results suggest that ion implantation alters the electrical characteristic of the diodes mainly by creating defects in the semiconductor depletion region. All such defects act as recombination centers giving rise to a deviation of the electrical characteristics from the normal behavior. They do not play a role in producing a Fermi level pinning.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Nuclear Inst. and Methods in Physics Research, B 19-20 (1987), S. 431-433 
    ISSN: 0168-583X
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Physics
    Type of Medium: Electronic Resource
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