ISSN:
0032-3888
Keywords:
Chemistry
;
Chemical Engineering
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
The principle of chemical amplification has proven to be successful for the design of highly sensitive, high resolution resist material. In many cases a strong Broensted acid, generated by photolysis of onium salt precursors, has been used to catalytically cleave an acid labile blocking moiety. A new approach to negative tone resist is based on acid catalyzed cleavage of acetal blocked aromatic aldehydes, which act as “latent electrophiles” and, under the influence of strong acid, react with the surrounding phenolic resin. If the acetal is polyfunctional or incorporated in a phenolic polymer chain, an increase in molecular weight, due to crosslinking, is observed. The resist is highly sensitive and allows the resolution of 0.5 μm features without swelling.
Additional Material:
7 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/pen.760322014
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