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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 64 (1988), S. 4478-4483 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Thermal and ion-induced reactions in codeposited, multilayer and bilayer Al-Ti and Al-Hf structures were studied by transmission electron microscopy and Rutherford backscattering. A metastable Al3 M (M being Ti or Hf) phase was found by both ion beam mixing and thermal annealing. The metastable phases have a cubic structure with lattice parameters a=3.98±0.01 A(ring) and 4.08±0.01 A(ring) for Al-Ti and Al-Hf, respectively, at a composition of Al3M. The metastable phase transforms to the tetragonal equilibrium compound at annealing temperatures approximately 400 °C. The effectiveness of ion beam mixing is demonstrated by its lower formation temperatures and faster reaction rates. The thermally induced metastable phase formation is ascribed to a lower nucleation barrier than that of the equilibrium phase.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 72 (1992), S. 4036-4040 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The dominant diffusion species in the formation of Al2Cu, Mg2Cu, and Mg2Ni have been determined. These compounds, rich in the lower melting point elements, are the first phases formed in metal/metal binary reactions. It is quite surprising to find that in all three systems, the minority elements, i.e., Cu or Ni, are the dominant diffusing species. This is in marked difference with results obtained in many metal/metal and metal/Si systems, where the dominant diffusion species are usually the majority elements in the initially formed compounds.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 72 (1992), S. 3423-3430 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The crystallization of thin-film, amorphous Co-Si alloys has been studied in the composition range of 42–80 at. % Si. Structural relaxation of the amorphous alloys preceded the crystallization. Crystallization temperature decreased slowly with increasing Si concentration, but showed a sharp decrease near the stoichiometric silicide compositions of CoSi and CoSi2. The crystallization of alloys close in composition to the disilicide (Co0.33Si0.67 and Co0.29Si0.71) was a one-step process with an activation energy of about 1.3 eV and an Avrami exponent of 3. In situ kinetic studies revealed that for the stoichiometric Co0.33Si0.67 alloy, the Avrami exponent of 3 arose from three-dimensional crystal growth from nuclei whose density saturated at the early stages of the transformation. The heat release and the volume contraction during crystallization of the Co0.33Si0.67 alloy were measured to be 0.118 eV/atom and 0.6%, respectively. In the case of a Co0.2Si0.8 alloy, which is considerably richer in Si than the disilicide composition, complete crystallization was achieved in a two-step process with a higher activation energy of 2.1 eV for the primary crystallization.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 72 (1992), S. 3821-3823 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Epitaxial regrowth and dopant activation of Sb-implanted Si and Si0.93Ge0.07 were investigated with ion channeling techniques and transmission electron microscopy. The presence of Sb greatly enhanced the regrowth rate of both Si and Si0.93Ge0.07. The initial crystallinity of Si0.93Ge0.07 was fully recovered after furnace annealing at 500–550 °C. Approximately 95% of Sb atoms were found on substitutional sites and most of them were electrically active.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 5161-5170 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: In situ resistance measurements, x-ray diffraction, Rutherford backscattering spectrometry, transmission electron microscopy, isothermal and constant heating rate differential scanning calorimetry and Auger electron spectrometry depth profiles have been used to investigate the interactions in copper and magnesium thin films leading to the growth of Cu2Mg and CuMg2 intermetallics. The effect of exposing the reacting interfaces to controlled exposure of oxygen on the nucleation and growth kinetics of such intermetallics was also investigated. It is found that the first phase to form is CuMg2, at about 200–215 °C. It is determined that the formation of CuMg2 occurs by a two step process consisting of nucleation and growth. The nucleation of CuMg2 takes place in a region composed of a Cu/Mg solid solution. The nuclei form at certain preferred sites and grow in directions both parallel and perpendicular to the surface, eventually leading to a continuous CuMg2 layer. The growth of CuMg2 nuclei in the plane of the original interface occurs at a constant rate, whereas the growth in a direction perpendicular to the original interface is found to be diffusion limited. In the presence of excess copper Cu2Mg forms at higher temperatures, with complete conversion to Cu2Mg occurring at about 380 °C. When the Cu surface is dosed with oxygen prior to Mg deposition, ramp rate differential scanning calorimetry (DSC) shows that the nucleation and growth of CuMg2 as well as the growth of Cu2Mg are not disturbed. Dosing the Mg surface with oxygen results in significant changes in the growth of the two phases. In this case a thin MgO layer is formed at the oxygen dosed surface, lateral growth of CuMg2 is unaffected, but vertical growth of CuMg2 across the oxygen dosed interfaces is delayed by 25–30 °C. The growth of Cu2Mg is also shown to be delayed, by 22–54 °C due to the interfacial oxygen dose.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 3566-3568 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We show that when processing conditions closely mimic those used in the conventional self-aligned silicide process, the effective activation energy for the polymorphic phase transformation of orthorhombic base-centered (oC12) C49-TiSi2 to the low-resistivity orthorhombic face-centered (oF24) C54-TiSi2 phase is over 1 eV higher than previously reported literature values where a 1-step heat cycle was used. For C49-TiSi2 films formed at temperatures of 600 and 625 °C on (100) single crystal silicon substrates, the activation energy was determined to be 5.6±0.3 and 5.7±0.13 eV, respectively, for the transformation of this phase into C54-TiSi2 in the temperature range of 625–700 °C. The higher activation energy obtained with the simulation of the self-aligned silicide processing conditions suggests that the conventional processing may need to be modified for future semiconductor applications.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 7419-7421 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Thermally induced reactions in TiN/Al–Cu/TiN have been investigated. It is observed that the amount of the reactions is different at the two interfaces between Al–Cu and TiN. While there is minimal reaction between Al–Cu and the TiN overlayer, the reaction between Al–Cu and the TiN underlayer increases the sheet resistance of Al–Cu by as much as 15%. It is further shown that the asymmetric reactions are most likely caused by the different degree of (111) texture of TiN grown on amorphous SiO2 and textured, polycrystalline Al–Cu. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 3959-3963 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Interdiffusion and reaction in Cu/PtSi/Si(100) structures have been investigated. During annealing Cu migrates across the intermediate PtSi layer and reacts with Si to form Cu silicides, with no indication of PtSi decomposition or a Cu-PtSi reaction. The diffusion of Cu through PtSi proceeds nonuniformly when PtSi is exposed to air before Cu deposition. Uniform transport is observed when the sample is prepared in situ without breaking vacuum. Cu silicides grow linearly with time, while the rates are independent of the thickness of the transport medium. The results indicate that Cu silicide formation is not controlled by Cu diffusion through the interposed PtSi layer.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 4958-4962 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The crystallization of coevaporated, amorphous CoSi2 with and without ion irradiation has been studied. Without ion irradiation, the crystallization of amorphous CoSi2 is characterized by three-dimensional growth from preexisting nuclei. The crystallization kinetics, described by the Avrami equation, are retarded by irradiating the as-deposited CoSi2 with either Si or Kr ions at liquid nitrogen temperature. The dose dependence of the crystallization kinetics can be divided into two regions. In the low dose regime, the crystallization kinetics decrease sharply with increasing dose, while the mode of crystal growth changes continuously from three-dimensional to two-dimensional growth. In the high dose regime, the crystallization kinetics are only slightly dependent on the irradiation dose. Nucleation occurs throughout the crystallization process and two-dimensional growth dominates.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 66 (1989), S. 3600-3603 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Pd/Ge bilayer samples with three different overall compositions centered around Pd2Ge have been thermally annealed or irradiated with 300 keV Kr ions at room temperature. We observed that the first phase formed with ion irradiation, as in thermal annealing is Pd2Ge. In the Pd75Ge25 sample, the formation of an amorphous phase as well as the Pd2Ge phase has been observed after 3×1015 Kr+/cm2 irradiation. Successive irradiations up to the 5×1015 Kr+/cm2 led to the demixing of this amorphous phase to Pd2Ge and Pd.
    Type of Medium: Electronic Resource
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