ISSN:
1013-9826
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
The magnetic filed arrangement of unbalance magnetron sputtering can be changedemployed to expand the plasma region and induce more ions to bombard the films for fabricatingexcellent quality films. In this paper, four targets closed-filed unbalance magnetron sputtering wasintroduced, the effect of the different magnetic field arrangement on the titanium oxide filmsproperties was investigated. By changing the distance from target to vacuum center, the differentunbalance state of the magnetic field was formed around the substrate. The titanium oxide films weresynthesized at different unbalance state of the magnetic field. The microstructure of the titaniumoxide films was studied by X-Ray Diffraction (XRD), and the residual stress measurement for thefilms was determined by grazing incidence XRD. The results revealed that the higher unbalance of themagnetic field around the substrate, the higher ion current of the substrate. Comparing with increasingthe substrate bias voltage, the ion current increased 2~4 times through changing magnetic fieldarrangement to induce higher unbalance of the magnetic field. Ion/atom ratio increase was in favor ofrutile phase formation for titanium oxide film. The unbalance state increase resulted in more highercompressive stress in the films
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/01/57/transtech_doi~10.4028%252Fwww.scientific.net%252FKEM.373-374.138.pdf
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