Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
67 (1995), S. 1996-1998
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Heteroepitaxial growth of dielectric SrTiO3(STO)/conductive SrVO3−x(SVO)/Si(100) structures was realized using a focused electron beam evaporation method. It was found from x-ray diffraction analysis and pole figure measurement that the epitaxial relationships were (100)STO (parallel)(100)SVO(parallel)(100)Si and 〈011〉STO(parallel)〈011〉SVO(parallel)〈001〉Si. It was also observed from depth profiling by secondary ion mass spectrometry that the interdiffusion of constituent elements among the films and Si substrate was not significant. Electrical properties of the STO film were characterized through I–V (current–voltage) and C–V (capacitance–voltage) measurements, after depositing Al electrodes on the STO/SVO/Si structure. The best values of breakdown field, resistivity, and dielectric constant were 345 kV/cm, 6.4×1012 Ω cm, and 243, respectively. © 1995 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.114765
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