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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 88 (2000), S. 1784-1787 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have previously concluded that the oxygen-precipitate-associated defects that we identified by the deep levels at Ev+0.30 eV and Ec−0.25 eV were the Pb centers generated in the interface between the oxygen precipitates and the surrounding silicon crystal lattice [M. Koizuka and H. Yamada-Kaneta, J. Appl. Phys. 84, 4255 (1998)]. In order to confirm this conclusion, we have made electron spin resonance (ESR) measurements on the Czochralski-grown silicon crystals containing the oxygen precipitates generated by the two-step anneals of 500 °C, 20 h+700 °C, 60 h. We have found the ESR lines whose g values well coincide with those of the Pb0 and Pb1 centers. Thus it has been clarified that the Pb0 and Pb1 centers are generated by the oxygen precipitation as well as by the thermal oxidation. The present successful application of the ESR method to the annealed silicon crystals suggests that it can be a useful tool to characterize the precipitation state of the oxygen in silicon. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 84 (1998), S. 4255-4258 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Deep level transient spectroscopy measurements have been made on both n- and p-type silicon crystals containing various types of the oxygen precipitates to investigate the associated gap states. A new signal in the gap-state density was observed at about Ec−0.25 eV, as well as the previously reported peak at about Ev+0.3 eV. Both peaks are attributed to a defect generated by oxygen precipitation. The observed distribution of the gap-state density is very similar to that of the well-known Pb center due to a dangling bond of a silicon atom at the interface between the silicon and silicon dioxide at the surface of the sample. The measured gap states could be passivated by hydrogen, as found for the Pb center. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Solid state phenomena Vol. 69-70 (Aug. 1999), p. 485-490 
    ISSN: 1662-9779
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Physics
    Type of Medium: Electronic Resource
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