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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 4673-4676 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: An empirical dielectric function (EDF) is proposed for optical characterization of amorphous materials. The EDF consists of the sum of damped harmonic oscillator terms whose square root amplitudes are distributed according to a hyperbolic function of photon energy connected to an exponential function. The usefulness of EDF is demonstrated by fitting it to the table values of dielectric constants for a-Si and a-Si3N4 and by applying it to the spectro-ellipsometric analysis of a-Si films deposited by vacuum evaporation and rf glow discharge methods. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 858-864 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: In1−xGaxSb1−yBiy (0〈x≤0.21, 0〈y≤0.005) quaternary bulk single crystals were grown on InSb seed crystals using a rotary Bridgman method. In order to investigate the quality of these crystals, various kinds of measurements were carried out, such as optical microscope, x-ray topograph, four-crystal x-ray diffractometry, electron-probe microanalysis, energy-dispersive spectroscopy, and secondary-ion-mass spectroscopy. All grown crystals were 10 mm in diameter and more than 10 mm in length. This indicates that the rotary Bridgman method was useful to grow quaternary bulk single crystals. Owing to segregation, the compositional ratio of Bi (y) increased and that of Ga (x) decreased as crystals grew. During growth of InGaSbBi, both Ga and Bi diffused into the InSb seed and there appeared domains of InBi. For comparison, InSb1−yBiy (0〈y≤0.05) and In1−xGaxSb (0〈x≤0.16) were grown on InSb. It turned out that Bi did not diffuse into InSb without Ga, but Ga diffused without Bi. The incorporation of Ga produced the excess In and as a result InBi domains were formed.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 67 (1995), S. 611-613 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A set of the different Si:Al and Si:B surface phases capped by amorphous Si layers were grown by molecular beam epitaxy (MBE). The formation of the buried interfaces was studied by low-energy electron diffraction and Auger electron spectroscopy. The conductivity and Hall effect measurements of the grown samples revealed that only the buried Si(111)(square root of)3×(square root of)3−B surface phase manifests itself as a highly doped degenerated layer, while all the buried Si:Al surface phases covered by amorphous Si show negligible activation of dopants. The difference in electrical properties of the buried surface phases are discussed in terms of the characteristics of their atomic structure. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 83 (1998), S. 5865-5869 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Conductivity and Hall-effect measurements have been carried out at 24 K for a set of various layered structures with buried B/Si surface phases used as delta-doped layers. Evidence is found for hole mobility enhancement as a consequence of boron dopant ordering. The electrical measurements reveal a basic difference in room temperature adsorption for boron on Si(100) and Si(111) surfaces. The characterization of the samples containing buried B/Si(111) interfaces and extra-thin Ge layers suggests promise for improving the structure and electrical properties of the buried surface phases. The hole mobility in epi-Si/Ge/B/Si(111) structures is found to be about 2.5 times higher than in epi-Si/B/Si(111) samples. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
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