Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
71 (1997), S. 894-896
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The problem of adsorption desorption of methyl radicals on a surface with nanoscale curvature is numerically studied for typical chemical vapor deposition diamond growth conditions. Surface profiles with concave nanoscale curvature lead to an increase in the energy of adsorption, which can enhance the nucleation of the new phase on the substrates. Moreover, the nanoscale curvature is even able to provoke a nucleation of the new phase on substrates which do not have an affinity for nucleation. © 1997 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.119680
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