Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
58 (1985), S. 1056-1057
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The effect of generating crosslinks in paraffins by electron impact was utilized to apply these aliphatic hydrocarbons as negative-acting electron-sensitive resists, capable of high structural resolution, anticipated from their low molecular weight. Owing to their chemical stability and relatively high vapor pressure above the melting point, paraffins may be vacuum deposited as thin uniform resist layers. The developing process makes use of the lower vapor pressure of the crosslinked material remaining on the substrate being heated to sublime the unexposed material in vacuum, thus completing an all-dry process.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.336312
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