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  • 1
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 70 (1997), S. 999-1001 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The response of B-ion-implanted type-IIa diamond to light ion (H, He) irradiation is investigated by monitoring the sample resistance as a function of dose. It is found that the resistivity of the layer increases rapidly with increasing dose, and reaches the resistivity of the undoped diamond for irradiation doses much less than those required for the onset of damage related electrical conductivity in pristine diamond. It is shown that defects created by the nuclear stopping process act as compensating centers for the B acceptors. The present findings are of importance for the design of radiation hard diamond based electronic devices and suggests a method for the isolation of B-doped devices on a diamond chip. The results of the present work also explain why the collection distance in intrinsic nondoped diamond radiation detectors actually increases with increasing ion dose. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 68 (1996), S. 2264-2266 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Record values for high Hall mobility and for low compensation ratio of boron doped diamond by ion implantation are reported. These are achieved, following the suggestion by Prins, by low dose Boron implantation into cold diamond (−97 °C) and in situ rapid heating (1050 °C for 10 min) and by a further anneal at higher temperature (1450 °C for 10 min). Detailed evaluation of Hall effect data and of the temperature dependence of the resistivity over a wide temperature range (200 to 700 K) prove that this implantation/annealing scheme yields p-type behavior of the implanted layer with the highest hole mobility (385 cm2/V s, at room temperature) and the lowest compensation ratio (0.05) ever reported for diamond doped by ion implantation. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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