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  • 1
    ISSN: 1436-5073
    Keywords: Key words: Aluminium; plasma-assisted nitriding; AlN; AES; TEM.
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Abstract.  Detailed examinations were made by AES depth profiling, SEM, TEM and electron diffraction to get information about the relation between treatment conditions and the state of plasma-nitrided aluminium. The chemical composition and the elemental depth distribution were proofed to be depending on gas phase mixture, pressure and temperature during plasma treatment. The admixture of hydrogen during presputtering for surface cleaning and during nitriding results both in an improved nitriding behaviour and in a reduction of the formation of conical-shaped particles at the surface. The microstructure of the nitride layer isn’t depending on tested process conditions significantly. Surface and interface between layer and substrate are roughly in a scale of a few ten nanometers owing to sputtering effects. The main phase inside the layer is nanocrystalline AlN of the known hexagonal modification. In addition, some crystallites of remaining aluminium are present as a second phase. In contrast to nitrogen-implanted aluminium no preferred lattice orientation of the AlN phase was evident.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Materials science forum Vol. 584-586 (June 2008), p. 988-993 
    ISSN: 1662-9752
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: The corrosion behaviour of the aluminium alloy, AA6082, processed by equal-channelangular pressing (ECAP) after different passes (route E, room temperature) was studied incomparison to the coarse-grained counterpart. The results of the electrochemical investigations(cyclovoltammetry; electrochemical impedance spectroscopy, EIS) are presented in correlation withthe microstructure before and after the corrosion examinations. Both, chemical (precipitations,phases) and physical (dislocations, high-angle grain boundaries, grain size, low-angle grainboundaries) inhomogeneities characterize the microstructure of this commercially used Al-Mg-Sialloy. Results indicate an improved resistance against pitting of the ECAP material expressed by areduced pitting density of up to 50 % and lower pit depths. EIS measurements and microstructuralexaminations (scanning electron microscopy, transmission electron microscopy, 3D topographymeasurement) confirm that ECAP modifies the number, size and distribution of theseinhomogeneities, which leads to a more favourable corrosion behaviour
    Type of Medium: Electronic Resource
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