ISSN:
0142-2421
Keywords:
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Physics
Notes:
Vapor phase decomposition-droplet surface etching-graphite furnace atomic absorption spectroscopy (VPD-DSE-GFAAS) is discussed as a technique for the determination of low levels of metals in chemical oxides on silicon surfaces. The VPD-DSE-GFAAS technique was found to be statistically equivalent to results obtained by the standard surface techniques of total reflectance x-ray fluorescence spectroscopy (TXRF) and SIMS. The capability of the VPD-DSE-GFAAS technique has been extended to detection limits in the 107 to low 109 atom cm-2 range. A positive linear relationship was found for iron, calcium, zinc and aluminum deposited on a silicon wafer from an ammonium hydroxide-hydrogen peroxide-water (SC1) solution. Sodium and potassium deposition from SC1 solutions was found to be independent of solution concentrations. Deposition for these metals appeared to be primarily related to localized micron-sized nuclei deposits and not to adsorption on an atomic scale.
Additional Material:
6 Ill.
Type of Medium:
Electronic Resource
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