ISSN:
1573-4803
Source:
Springer Online Journal Archives 1860-2000
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Abstract Tin oxide and platinum layers were deposited on oxidized silicon wafers by ion-beam sputtering. The hydrogen gas sensing properties of undoped films and platinum-doped films were examined at 300°C for films annealed at 500°C. It was observed that the surface platinum when annealed together with the tin oxide film increased the sensitivity and reduced the response time compared with those of undoped films. Longer annealing tended to shift the optimum sensor thickness to a thicker side; the optimum thickness changed from 17 to 37 nm as the annealing time increased from 2 to 50 h. The interdiffusivity between the platinum and the tin atoms in the bulk was negligibly small at 300°C.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF02385431
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