ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
This paper describes a simple and compact manual synchrotron radiation x-ray exposure system for fundamental research on ultrafine pattern fabrication with x-ray lithography. Special requirements for printing ultrafine patterns are investigated, and a step-and-repeat exposure system that includes a new gap-setting, a soft-contact mechanism in a vacuum, and a rough alignment mechanism is developed. All the mechanisms are neatly packed into a small vacuum chamber and are manually remote controlled. The system can be used for various fundamental studies. It is especially useful for experiments to print ultrafine patterns using x-ray cross-sectioned and phase-shifting masks. The success of a variety of experiments verifies the good performance and usefulness of this system. © 1995 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1146520
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