ISSN:
1013-9826
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Thin films of HfO2 were fabricated on a p-Si(001) substrate using double pulse excitation (DPE)pulsed laser deposition (PLD) with KrF excimer and Nd:YAG lasers, and using conventionalNd:YAG laser PLD under two typical oxygen pressures (7.3 × 10-2 and 7.3 × 10-1 Pa). At 400°C orhigher temperatures, the films are crystalline; at less than 400°C, they are amorphous. At higheroxygen pressures, DPE-PLD was effective against droplets. Then the surface morphology andelectrical insulation properties of thin films were improved. At lower pressure, DPE-PLD wasineffective
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/01/55/transtech_doi~10.4028%252Fwww.scientific.net%252FKEM.350.129.pdf
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