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  • 1990-1994
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    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 42 (1987), S. 263-267 
    ISSN: 1432-0630
    Keywords: 66.30.Jt ; 61.70.Tm
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract The diffusion coefficients of nitrogen in N-implanted polycrystalline Ni have been deduced. Both bulk and Ni-evaporated samples implanted with nitrogen were annealed at 150–500° C. The nitrogen profiles were probed using the nuclear resonance broadening technique. The value of 0.99±0.12 eV for the activation energy and (3.0 −2.8 +40 )×10−6 cm2/s for the frequency factor were obtained for implanted N in bulk Ni. The solubilities for both the bulk and evaporated Ni samples are given. In evaporated Ni nitrogen migration is enhanced due to the defects arising during evaporation.
    Type of Medium: Electronic Resource
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