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  • 1995-1999  (3)
  • 1996  (3)
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  • 1995-1999  (3)
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  • 1
    Electronic Resource
    Electronic Resource
    Enhancement of orbital magnetism at surfaces: Co on Cu(100) (abstract) : The 40th annual conference on magnetism and magnetic materials (1996)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 4983-4983 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: By combining MCXD experiments with first principles electronic structure calculations, we demonstrate that the orbital contribution to magnetism can be strongly enhanced at surfaces. This effect is illustrated for Co grown on a Cu(100) surface. The MCXD measurements were performed using the SX 700 plane grating monochromators at BESSY. The Co films were evaporated and characterized in situ, for their cleanness, thickness (1.6–50 ML), and structural order. For a film thickness up to 2.2 ML, measurements of the ac MCXD susceptibility response at a fixed photon energy allowed one to measure the critical temperature, Tc, of the films and their critical properties were characterized in situ. For several samples the MCXD response as a function of the x-ray incidence angle was investigated as well. This allows one to quantify and correct saturation effects that can occur in the measurements. Data were taken in a temperature range between 40 and 350 K, and for many samples measurements were performed at several reduced temperatures, T/Tc. The first layer of Co on the Cu(100) surface shows an enhanced orbital moment, in contrast to the subsequent layers where the orbital moment is bulklike. The lowering of the symmetry, the enhanced spin moment, and the increased value of the density of states at the Fermi level are factors that combine to give the observed enhancements. © 1996 American Institute of Physics. [S0021-8979(96)679608-0]
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.361611
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    Paper (German National Licenses)
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  • 2
    Electronic Resource
    Electronic Resource
    The magnetism of nickel monolayers (1996)
    Springer
    Applied physics 62 (1996), S. 417-427 
    Details
    ISSN: 1432-0630
    Keywords: 75.70Ak ; 75.30Gw ; 73.20-r
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract Nickel allows to study the largest variety of phenomena in the magnetism of UHV ultrathin films. The low critical temperature of ≈ 630 K for the bulk favors experiments from 0 K to aboveT c and from one monolayer to infinite thick films. The thickness dependence ofT c (d) for the (001) and the (111) orientation is compared. Susceptibility measurements in UHV are presented, and from χmax the film geometry can be deduced. Ferromagnetic resonance measures the second- and fourth-order anisotropy constants. These give a clear understanding of when and how the reorientation transition from the in-plane to the perpendicular orientation occurs and its nature. Magnetic resonance and circular X-ray dichroism measure the spin and orbital parts of the magnetic moment µ, its anisotropy Δµ, and the 3d and 4sp contributions. Finally, we show how a 4 Monolayer (ML) Ni(001) film can be transformed into NiO by controlled oxygen dosage and thermal treatment.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01567112
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    Paper (German National Licenses)
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  • 3
    Electronic Resource
    Electronic Resource
    The magnetism of nickel monolayers (1996)
    Springer
    Applied physics 62 (1996), S. 417-427 
    Details
    ISSN: 1432-0630
    Keywords: PACS: 75.70Ak; 75.30Gw; 73.20 ; r
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract.  Nickel allows to study the largest variety of phenomena in the magnetism of UHV ultrathin films. The low critical temperature of ≈630 K for the bulk favors experiments from 0 K to above T c and from one monolayer to infinite thick films. The thickness dependence of T c (d) for the (001) and the (111) orientation is compared. Susceptibility measurements in UHV are presented, and from χmax the film geometry can be deduced. Ferromagnetic resonance measures the second- and fourth-order anisotropy constants. These give a clear understanding of when and how the reorientation transition from the in-plane to the perpendicular orientation occurs and its nature. Magnetic resonance and circular X-ray dichroism measure the spin and orbital parts of the magnetic moment μ, its anisotropy Δμ, and the 3d and 4sp contributions. Finally, we show how a 4 Monolayer (ML) Ni (001) film can be transformed into NiO by controlled oxygen dosage and thermal treatment.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/s003390050318
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
    Paper (German National Licenses)
    Fulltext
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