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  • 2000-2004  (1)
  • 1985-1989  (2)
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  • 1
    Electronic Resource
    Electronic Resource
    Springer
    European journal of clinical pharmacology 55 (2000), S. 765-771 
    ISSN: 1432-1041
    Keywords: Key words Nursing home ; Drug utilisation ; Elderly
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Medicine
    Notes: Abstract Objective: To quantify and evaluate drug utilisation in a sample of Dutch nursing homes. Methods: A retrospective analysis of computerised medication data of 2355 residents aged 65 years and over from six nursing homes in the Netherlands was performed. For each therapeutic drug group, the number of users was determined. The ten therapeutic groups used most frequently were investigated further. For these, patient characteristics, use of therapeutic subgroups, the average daily dosages and the chronicity of drug use were determined. Chronicity was expressed as the percentage of treatment days divided by the number of residents' days in the nursing home. Results: During the study period, 89%, 77% and 56% of the study population used a drug from the anatomical therapeutic chemical (ATC) main group N (nervous system), A (alimentary tract and metabolism) and C (cardiovascular system), respectively. Eight of the ten therapeutic drug groups prescribed most frequently were used for more than 50% of the time. In particular, psycholeptic drugs, diuretics and laxatives were used chronically (83%, 81%, and 80% of the nursing home stay, respectively). Except for a few drug groups, such as laxatives and diuretics, the prescribed daily dosages were relatively low. Twenty-eight percent of the residents received loop diuretics; these were prescribed in relatively high dosages. Conclusion: Drug utilisation in the nursing homes was high and many drugs were used chronically. In view of the risk of possible adverse effects and drug–drug interactions, the prescribing and dosage of psycholeptic drugs, laxatives, loop diuretics and ulcer-healing drugs should be re-evaluated, carefully.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 58 (1985), S. 2074-2076 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: It is demonstrated that the measured value of the self-bias voltage on electrodes with an insulating target plate in a radio-frequency dry etching system is strongly influenced by the configuration of the electrode, and may have no straightforward relation with the actual self-bias voltage between the target surface and ground. The mechanism allowing measurement of the self-bias voltage is identified as plasma-induced surface conduction on the insulating target plate assisted by high electric fields at the target plate edge.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 57 (1985), S. 4386-4390 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: It is demonstrated that microwave cutoff can be used to measure absolute electron densities for CHF3, Ar, and O2 plasmas in a batch-mode planar reactor excited at 13.56 MHz. The densities obtained are between 1015 and 1016 m−3 for all gases and a large set of conditions (pressure, rf power, electrode spacing). A comparison with selective etching of SiO2 over Si in the same reactor shows a qualitative agreement between the substrate ion flux calculated from the electron density and the etch rate of silicon oxide; the apparent sputter yield ranges from 0.4 to 1.4 molecules per ion.
    Type of Medium: Electronic Resource
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