Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
58 (1985), S. 2074-2076
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
It is demonstrated that the measured value of the self-bias voltage on electrodes with an insulating target plate in a radio-frequency dry etching system is strongly influenced by the configuration of the electrode, and may have no straightforward relation with the actual self-bias voltage between the target surface and ground. The mechanism allowing measurement of the self-bias voltage is identified as plasma-induced surface conduction on the insulating target plate assisted by high electric fields at the target plate edge.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.335968
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